Fig. 2: Characterizations of tessellation pattern of DNA origami.

a Schematic illustration of the synthesis route of large size 2D DNA films by the tessellation of unit cells. b Optical image of a typical flake of micron-meter sized DNA film, deposited onto a SiO₂(300 nm)/Si⁺⁺ wafer. Scale bar, 10 μm. Notice that the optical contrast shown here is the blue channel extracted from an RGB format, which is named as LUT mode in the microscope (See Methods section). c Intensity profile along the white dashed arrow indicated in (b) plotted in Red, Green, and Blue channels recorded by the camera. d The renormalized reflectance difference (defined as \(\frac{{R}_{{{{\rm{B}}}}}-{R}_{{{{\rm{S}}}}}}{{R}_{{{{\rm{B}}}}}}\), where R_B and R_S are reflectance measured at the background and the sample areas, respectively) between the 2D DNA film placed onto SiO₂(300 nm)/Si⁺⁺ substrate and the substrate as a function of wavelength of the perpendicularly incident light. e A drum-like 2D DNA film suspended on an etched hole on a Silicon (100) substrate. Diameter of the hole is 3.6 μm. f Typical curve of the tensile strain force versus indentation depth of a DNA drum shown in (e) The experimental data (black squares) were obtained by approaching an atomic force microscope (AFM) tip (see Methods section) onto the surface of suspended DNA film and then fitted by using a nonlinear force-displacement model⁴¹ (red line). g Comparison between DNA film with and without h-BN protection, when subjected to a heating session in air. It is seen that after being heated at 180 °C for 30 min in air, the h-BN protected area is preserved, while the counter part without protection has been severely degraded.