Fig. 3: Non-destructive photolithography of organic neuromorphic devices.
From: CMOS-integrated organic neuromorphic imagers for high-resolution dual-modal imaging
a Chemical structure of the photocrosslinker (left). Schematic diagrams of the mechanism processes (right). Photogenerated nitrene- crosslinkers bridge alkyl-chain on adjacent polymers via C-H insertion. Polymer BHJs lose colloidal stability in the original solution after UV exposure. b Overview of the patterning procedures for BHJs, including ink coating, UV exposure, and development of BHJ patterns using nonpolar solvents. c CMOS-compatible photolithography. The top photograph of the CMOS ROICs with a resolution of 640 × 512 pixels. Optical microscope images of BHJ patterns tailored to the pixel dimensions of CMOS (bottom). d Images of various linewidths of BHJ patterns. e Images of a large-area periodic table of elements pattern on a 4-inch wafer. The insert shows a zoomed-in view.
