Fig. 3: MM of the bare silicon wafer.
From: Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology
a Schematic of data analysis: (A) shows the comparison of the MM spectrum with theoretical values for both (I) before and (II) after the system factors removal. (B) and (C) represent the spectrum errors between the MM spectrum at the FOV center and those in other regions of the FOV. (B) shows the results with system factors remaining, while (C) represents the result after the system factors have been removed. b The results of (A), (B), and (C) for all MM elements.
