Fig. 4: Fabrication process of patterned optical active MOF films with tunable CPL. | Nature Communications

Fig. 4: Fabrication process of patterned optical active MOF films with tunable CPL.

From: Twisted-stacking MOF patterns with tailorable circularly polarized luminescence properties and encryption applications

Fig. 4: Fabrication process of patterned optical active MOF films with tunable CPL.

a Schematic diagram of the arbitrary programmable CPL pattern process for twisted-stacking structure of the MOF via the combination of screen printing and brush painting process. b A matrix of MOF films with tailorable chirality. The patches in each row were doped with different concentrations of Berberine and in each column with varying orientations of MOF, resulting in a 2D matrix of MOF patches, each owns characteristic chirality and intensity. The inset shows the fluorescence image of the MOF film matrix viewed with naked eyes. c The CPL spectra of different distinct regions of the different patterned optical active MOF films. The insets show the fluorescence and phosphorescence images of the patterned MOF film viewed with naked eyes. d The fluorescence images of the MOF film under different deformation conditions such as flat laying, bending, twisting, and restoring, and CPL spectra of MOF films on several semicylindrical surfaces with different curvatures (D = 10 mm, 20 mm, 30 mm, and flat as a comparison) using flexible PDMS films as support. Scale bar for the fluorescent patterns: 1 cm.

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