Fig. 1: Structural characterizations and synthesis strategy of two-dimensional (2D) CrOCl.
From: Chemical vapor deposition growth of continuous monolayer antiferromagnetic CrOCl films
a Schematic diagram of the chemical vapor deposition (CVD) growth of continuous CrOCl monolayer films and CrOCl nanosheets. The green arrow indicates the direction of argon (Ar) gas. b A typical optical microscopic (OM) image of as-grown CrOCl monolayer film transferred onto SiO2/Si (300 nm) substrate. OM image of synthesized CrOCl nanosheets (c) on a mica substrate and (d) transferred to SiO2/Si (300 nm) substrate, inset is the corresponding atomic force microscopy (AFM) image. e Raman spectra of as-grown CrOCl nanosheets with different thicknesses on SiO2/Si (300 nm). f X-ray diffraction (XRD) of as-grown CrOCl nanosheets on SiO2/Si (300 nm). g X-ray photoelectron spectroscopy (XPS) survey spectra and detailed signals of the (h) Cr 2p, (i) O 1 s, and (j) Cl 2p of CrOCl nanosheets. The dots and lines represent experimental data and fitted curves, respectively.
