Fig. 4: Adhesion of single atom Ru-supported (Ru SA)-rGO/SAM to Cu. | Nature Communications

Fig. 4: Adhesion of single atom Ru-supported (Ru SA)-rGO/SAM to Cu.

From: Single atom Ru-supported reduced graphene oxide integrated self-assembled monolayer as a nm-scale Cu diffusion barrier

Fig. 4: Adhesion of single atom Ru-supported (Ru SA)-rGO/SAM to Cu.

a Schematic diagram of tape adhesion test. b AFM image of the interface between Cu/Ru SA-rGO/SAM and SiO2. c AFM image of the Cu/Ru SA-rGO/SAM structure. SEM images of d Cu/SiO2 and e Cu/Ru SA-rGO/SAM/SiO2 after annealing at 500 °C for 30 min. Source data are provided as a Source Data file.

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