Table 1 Comparison of the tortuosity of different electrodes

From: Fabrication of low-tortuosity thick electrodes with low material loss by temporally shaped ultraviolet femtosecond laser

Areal mass loading (mg cm−2)

Thickness of active materials (μm)

Ionic impedance Rion (Ω) of unstructured LFP

Ionic impedance Rion (Ω) laser-structured LFP

Tortuosity of unstructured LFP

Tortuosity of laser-structured LFP

Reduction of tortuosity

14

60

201.51

152.02

2.62

2.02

22.9%

30

130

428.20

338.17

2.57

2.08

19.1%

40

170

562.65

444.46

2.58

2.09

19.0%

60

260

641.86

823.26

2.47

1.97

20.2%

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