Fig. 2: Fabrication and static characterization of the proposed modulator. | Nature Communications

Fig. 2: Fabrication and static characterization of the proposed modulator.

From: Ultracompact and large-bandwidth silicon modulator in a CMOS-compatible foundry

Fig. 2: Fabrication and static characterization of the proposed modulator.

a Optical microscope image of the fabricated photonic crystal nanobeam cavity modulator. b Magnified optical image of the center of the proposed device. c Measured transmission spectra versus reverse bias voltage ranging from −1 V to −5 V; the inset shows the detailed optical spectra under the bias of −2 V, −3 V, and −4 V, respectively. G ground, S signal.

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