Table 1 Parameters for the generation of simulated uneven illumination

From: Automatic optimization of flat-field corrections by evaluation and enhancement (EVEN) in multimodal optical microscopy

Property

Extension of uneven illumination

Position of maximum intensity

Free parameter

\({\sigma }_{x},\,{\sigma }_{y}\)

\({x}_{0},{y}_{0}\)

Value interval

[0.4, 1.2]

[0, 0.2]

Distribution

Constant increase in the interval

Random values with uniform distribution

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