Fig. 4: Relaxation times and the defect-limited resistivity for vacancy defects in copper. | npj Computational Materials

Fig. 4: Relaxation times and the defect-limited resistivity for vacancy defects in copper.

From: Ab initio electron-defect interactions using Wannier functions

Fig. 4

a RTs mapped on the Fermi surface, obtained using interpolated e–d matrix elements for a reference vacancy concentration of 1 p.p.m. b Defect-limited resistivity as a function of temperature for an assumed reference vacancy concentration of 1 p.p.m., compared with experimental data from ref. 34.

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