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Atomic dynamics of gas-dependent oxide reducibility

Abstract

Understanding oxide reduction is critical for advancing metal production1,2, catalysis3,4 and energy technologies5. Although carbon monoxide (CO) and hydrogen (H2) are widely used reductants, the mechanisms by which they work are often presumed to be similar, both involving lattice oxygen removal6,7,8,9. However, because of growing interest in replacing CO with H2 to lower CO2 emissions, distinguishing gas-specific reduction pathways is critical. Yet, capturing these atomic-scale processes under reactive gas and high-temperature conditions remains challenging. Here we use environmental transmission electron microscopy, which is capable of real-time, atomic-resolution imaging of gas–solid redox reactions10,11,12,13,14,15,16, to directly visualize the gas-dependent oxide reduction dynamics in NiO. We show that CO drives surface nucleation and the growth of metallic Ni islands, leading to self-limiting surface metallization. Conversely, H2 activates a coupled surface-to-bulk transformation, where protons from dissociated H2 infiltrate the oxide lattice to promote the inward migration of surface-generated oxygen vacancies and enabling bulk metallization. By contrast, oxygen vacancies formed by CO remain confined near the surface, where they rapidly form a metallic Ni layer that inhibits further reduction. These results reveal distinct atomistic pathways for CO and H2 and provide insights that may guide metallurgical processes and catalyst design.

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Fig. 1: In situ TEM observation of NiO reduction dynamics in CO.
Fig. 2: In situ TEM imaging of NiO reduction in H2.
Fig. 3: In situ XRD, NAP-XPS and RGA measurements of NiO reduction at 400 °C.
Fig. 4: DFT modelling for diffusion energy barriers, VO clustering and Bader charge analysis.

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All data generated or analysed during this study are included in the article (and its Supplementary Information). Source data are provided with this paper.

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Acknowledgements

This work was supported by the US National Science Foundation (Grant No. DMR 2303712). The computational modelling work was supported by the US Department of Energy, Office of Basic Energy Sciences, Division of Materials Sciences and Engineering (Award No. DE-SC0001135). This research used the Electron Microscopy, Proximal Probes, and Theory and Computation resources of the Center for Functional Nanomaterials and beamline 7-BM (QAS) at the National Synchrotron Light Source II, which are US DOE Office of Science User Facilities, at Brookhaven National Laboratory under Contract No. DE-SC0012704. Work at the beamline was supported in part by the Synchrotron Catalysis Consortium, US Department of Energy (Grant No. DE-SC0012335).

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Authors and Affiliations

Authors

Contributions

G.Z. and X.C. conceived the idea and designed the in situ TEM experiments. X.C. performed the in situ TEM and ex situ TEM experiments. J.W., Z.Z., X.C., Q.W. and G.Z. designed and performed the DFT calculations. S.B.P. and J.A.B. conducted the NAP-XPS experiments. X.C., Y. Wang, N.M. and L.M. conducted the in situ XRD and RGA experiments. X.C., S.Y., Y. Wu, L.Q., M.L., S.H., D.N.Z., J.C.Y. and G.Z. carried out the data analysis. X.C. and G.Z. wrote the paper, and all authors reviewed and approved the final version. This work was done under the supervision of G.Z.

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Correspondence to Guangwen Zhou.

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Extended data figures and tables

Extended Data Fig. 1 DFT modelling of CO and H2 adsorption on NiO(100) and H2 dissociation at NiO(100).

a, CO adsorption on perfect NiO(100), NiO(100) with either Ni vacancies (VNi) or O vacancies (VO), and step edges containing either VNi or VO. b, CO adsorption at the top, O and Ni sites of the interfacial periphery of a Ni cluster on NiO(100), as well as on flat Ni(100). c, H2 adsorption on perfect NiO(100), NiO(100) terraces containing either VNi or VO, and step edges containing either VNi or VO. d, Heterolytic dissociation of H2 on perfect NiO(100) and along intact step edges, resulting in the formation of NiH and OH species. e, H2 adsorbed at VO-containing terraces and step edges undergoes heterolytic dissociation, forming NiH and OH species. f, H2 adsorbed at the VNi-containing NiO(100) terrace dissociates heterolytically to produce NiH and OH, while H2 at the VNi site of the step edge undergoes spontaneous homolytic splitting, forming two OH groups.

Extended Data Fig. 2 DFT calculations of diffusion energy barriers, adsorption energies and relaxed structures.

a, Diffusion barrier of a Ni adatom on NiO(100). b, Adsorption energies of a Ni adatom on perfect NiO(100), along monoatomic step edge, double-layer step edge, and triple-layer step edge. c, Energy barrier for Ni vacancy migration in the NiO bulk. c, DFT-calculated barrier (1.79 eV) for the migration of Ni to VNi in the NiO bulk. d, DFT-calculated barrier (1.70 eV) for the migration of an O vacancy in the topmost NiO surface layer. e, DFT-calculated barriers and comparison with literature data10,56,57. f, DFT-relaxed structures as a function of O vacancy concentrations in the NiO lattice. The metallization process involves significant Ni diffusion in the highly O-deficient lattice. The resulting nearest Ni-Ni distance of 2.58 Å closely matches the nearest Ni-Ni interatomic distance of 2.46 Å in face-center cubic (FCC) Ni. In a H2 atmosphere, the NiO lattice is primarily dominated by O vacancies, making the diffusion of Ni cations less likely due to the limited availability of Ni vacancies. Additionally, Ni cations are unlikely to migrate to O vacancy sites because of electrostatic repulsion, as these vacancies are surrounded by positively charged Ni ions, making such migration energetically unfavorable. However, as the concentration of O vacancies increases, the NiO lattice becomes increasingly unstable, eventually breaking down into metallic Ni. This metallization process involves significant Ni diffusion in the highly O-deficient lattice.

Extended Data Fig. 3 In-situ TEM imaging of NiO reduction in CO and H2.

a, b, HRTEM images and corresponding diffractograms of selected regions (marked by dashed blue squares), along with simulated electron diffraction patterns, illustrating the reduction of NiO to Ni islands under CO at 400 °C and pressures of ~0.03 Pa (a) and ~1 Pa (b). Moiré fringes in the HRTEM images arise from the overlapping lattices of Ni (FCC) and NiO (rock-salt). The electron diffraction simulations model the cube-on-cube orientation relationship between Ni and NiO, along the [001] zone axis in (a) and the \([01\bar{1}]\) zone axis (b). Red and black spots in the simulated patterns correspond to diffraction spots from NiO and Ni, respectively. The alignment of experimental diffractograms with simulations confirms the crystallographic overlap of Ni and NiO as the source of the Moiré contrast. Simulations of overlapping NiO grains produce distinct patterns that do not match the experimental diffractograms, ruling out alternative origins for the Moiré fringes. c, Time-sequence HRTEM images (Supplementary Video 5) illustrating the internal metallization process, leading to the transformation of NiO to Ni in the bulk at 400 °C and ~0.04 Pa H2. The white dashed lines outline the NiO/Ni interface, demonstrating the outward propagation of the NiO/Ni interface toward the NiO region, resulting in the complete NiO reduction to Ni from the bulk toward the surface. d, Time-sequence HRTEM images viewed along the \([01\bar{1}]\) zone axis, illustrating NiO growth along the top-left stepped region via the re-oxidation of Ni adatoms by lattice O in NiO, and the formation of vacancy clusters in the bulk during the NiO reduction at 400 °C and ≈ 0.04 Pa H2. The white dashed lines outline the initial surface profile of the NiO surface at 0 s, showing the receding motion of the atomic step on the top and bottom-left surface facets, with net NiO growth along the stepped region at the top-left corner. The dashed circles mark the clustering of O vacancies generated during the NiO reduction. e, Real-time HRTEM images (Supplementary Video 6) using low electron flux (~7 × 104 e/nm2 s), depicting NiO reduction processes at 400 °C in ~1 × 10−3 Pa H2, starting from surface decay, followed by vacancy clustering (dashed white cycles) in the bulk, and ultimately leading to the collapse of the NiO lattice. Dashed red lines are the trace of the position and configuration of the outermost surface of the NiO at 0 s, showing the collapse of the NiO volume shrinkage. f, Real-time TEM imaging using low electron flux (~2 × 103 e/nm2 s), showing the dynamic formation of vacancy clusters (marked by white dashed circles) in the bulk, followed by the collapse of the oxide structure during NiO reduction at 400 °C and ~1.33 Pa H2. All the HRTEM images and corresponding diffractograms are presented with pseudo-color overlays.

Extended Data Fig. 4 DFT calculations of O vacancy formation energies.

a, Comparison of O vacancy formation energies for placing a single O vacancy (VO), first in the topmost surface layer (1st), and subsequently in the 2nd, 3rd, and 4th subsurface layers, respectively, show the more favorable VO formation in the 2nd than the 1st and deeper layers, consistent with the trends in the reported studies50,55. b, DFT relaxed structures of the VO-containing atomic layer shown in (a), with measured intralayer Ni-VO distances (left panel) and interlayer Ni-VO distances (right). The VO in the topmost layer exhibits the largest intralayer Ni-VO distance (2.06 Å), compared to those (2.02 Å and 2.03 Å) in the 2nd and 3rd layers. The VO in the second layer leads to the downward relaxation of the Ni atom in the top layer (directly above the VO), resulting in a shorter interlayer Ni-VO distance (1.96 Å) compared to those for the VO in the 1st and 3rd layers. c, Electron localization function (ELF) maps of the VO-containing atomic layers, showing that the VO in the topmost surface layer exhibits the highest electron localization, while the VO in the second layer shows the most electron delocalization. d, DFT calculated PDOS for Ni 3d and O 2p orbitals in the topmost four atomic layers of NiO, including perfect NiO, NiO with the presence of a single VO formed either in the topmost layer, second layer, or third layer, respectively. The vertical dashed lines indicate the Fermi level. e, f, Electron numbers obtained by integrating the PDOS of Ni 3d and O 2p orbitals over the entire energy range (d), illustrating that the Ni atom in the 1st layer, directly above the VO in the 2nd layer, experiences the largest increase in the electron population of the Ni 3d orbital. VO1, VO2, and VO3 represent the presence of a single VO formed either in the 1st, 2nd, or 3rd layers, respectively. The different colors correspond to the Ni and O atoms in the top four atomic layers. The dashed lines in (e) and (f) represent reference values for the electron numbers in the 1st layer of the perfect NiO structure, providing a baseline for comparison.

Extended Data Fig. 5 In-situ TEM imaging of vacancy cluster formation in NiO under H2 and their self-healing upon switching to O2.

a, Real-time HRTEM images (Supplementary Video 7) showing the formation of vacancy clusters during NiO reduction at 450 °C and ~0.03 Pa H2. b, Time-sequence HRTEM images (Supplementary Video 8) illustrating the self-healing of the vacancy cluster regions after switching to ~0.03 Pa O2 at 450 °C. c, d, Zoom-in HRTEM views of the regions marked by the dashed white boxes in (a, b), highlighting the formation and dynamic motion of vacancy clusters (marked by dashed red circles) during H2 exposure, as well as the healing process of the vacancy clusters upon exposure to O2. t0 denotes the start of the imaging sequence. The white arrow in (a) highlights the newly formed NiO in the highly stepped surface regions. Dashed red lines track the initial surface profiles of NiO at t0 and their corresponding overlays into the following snapshots in (a, b). e, Comparison of experimental and simulated HRTEM images using a structure model of an O vacancy cluster in the NiO lattice, preserving the integrity of the Ni sublattice. The dashed red circles highlight the regions with brighter image contrast of the atom columns. Inset intensity profiles (marked by white dashed rectangles in (e)) show a brighter image contrast for the atom columns in the O vacancy cluster region in the simulated HRTEM image, matching the contrast observed in the experimental HRTEM image. These in-situ images capture the dynamic contrast changes in the same sample regions during reduction in H2, where progressive brightening of atom columns correlates with the accumulation of oxygen vacancies, and during oxidation in O2, where the annihilation of O vacancies leads to the dimming of the atom column contrast to baseline intensity. While static HRTEM images alone are insufficient to resolve this, the time-resolved image sequence provides clear evidence of oxygen vacancy dynamics.

Extended Data Fig. 6 Ex-situ HAADF-STEM characterizations of furnace-reduced NiO samples and in-situ EELS measurements of NiO reduction in H2 and CO.

a-c, Ex-situ HAADF-STEM images (with pseudo-color overlays) of NiO reduced at 400 °C and ~0.67 Pa H2 for 60 min, revealing a porous morphology and weak-contrast regions indicative of O vacancy clusters (highlighted by dotted red circles). d-f, Ex-situ HAADF-STEM images (with pseudo-color overlays) of NiO reduced at 400 °C and ~0.67 Pa CO for 60 min, showing a more compact morphology and the absence of weak-contrast regions typically associated with O-vacancy clusters in the crystal lattice. g-l, In-situ HAADF images and corresponding O-K and Ni-L2,3 edges collected from locations 1–5 within the same region of the NiO sample at 400 °C, first in ≈ 0.67 Pa O2 (g-i), and then after switching to ~0.67 Pa H2 (j-l). m-r, In-situ HAADF images and corresponding O-K and Ni-L2,3 edge obtained from spots 1–5 within the same region of the NiO sample at 400 °C, first in the O2 atmosphere at ≈ 0.67 Pa O2 (m-o), followed by switching to a CO atmosphere at ~0.67 Pa CO (p-r). The L3/L2 ratios of the Ni L edge are included in i, l, o and r.

Extended Data Fig. 7 In-situ XRD and RGA measurements of NiO reduction in CO and H2.

a-c, TEM characterizations of the pristine NiO nanoparticles (Johnson Matthey & Co. Ltd) reveal their morphology, crystal structure, and atomic-scale arrangements. d, XRD analysis of the pristine NiO powder confirms its crystal structure and indicates a crystallite size of approximately 270 nm. e, f, Evolution of the partial pressures of He, CO, CO2 during NiO reduction in CO, and He, H2, H2O during NiO reduction in H2, respectively. These RGA spectra are acquired concurrently with the XRD data in Fig. 3(a, b). g, The Clausen cell setup for XRD and RGA measurements. The RGA measurements of partial pressures for the product gases obtained with this setup may be influenced by several factors, including the small sample loading (2 ~ 3 mg), compaction level of the powder samples, gas pressure build-up in the glass tube, and variations in total gas pressure between different experiments. In particular, the higher sticking probability of H2O molecules to the walls of the long gas tube, compared to CO2 molecules, may lead to an underestimation of actual H2O production. h, i, Evolution of the partial pressures of Ar, CO, CO2 during NiO reduction in CO, and Ar, H2, H2O during NiO reduction in H2 using a tube reactor, respectively. j, Calibrated partial pressures of CO2 and H2O measured during NiO reduction in CO (h) and H2 (i)58. The inset in (h) illustrates the tube reactor used for the RGA measurements in (h, i). This setup allows for larger sample loads (~30 mg), controlled gas pressures, and a short distance between the reactor and the RGA sensor. k-m, Real-time XRD and RGA measurements using the setup in (g), showing NiO reduction in 5% CO/He, initially at 500 °C, followed by an increase in temperature to 600 °C, leading to further NiO reduction and the formation of a thicker metallic Ni overlayer (k). l, Normalized intensity evolution of the NiO(111) reflection during NiO reduction in CO (k). Coordinated RGA measurements (m) show the evolution of the partial pressures of CO and CO2, first at 500 °C and then at 600 °C, with the blue boxes highlighting the self-limiting production of CO2 at each temperature.

Extended Data Fig. 8 DFT predicted H adsorption configurations, H diffusion energy barriers, and Barder charges of Ni ions upon H+ adsorption.

a, Decrease in H adsorption energy by 0.48 eV as the adsorption site transitions from Ni to O. b, Initial and final states (IS and FS) of the adsorption configurations of H adsorbed to lattice O and Ni, respectively, in the NiO bulk, showing stable adsorption at the O site and the spontaneous transfer of H from the initially adsorbed Ni site to the adjacent O site. c, DFT-calculated energy barrier for the diffusion of interstitial H in NiO bulk, indicating the ease with which protons can infiltrate the NiO lattice, characterized by a small barrier of 0.62 eV. d, Bader charges of surface Ni ions surrounding the lattice O with an adsorbed H+ atop. e, Bader charges of Ni ions surrounding the H+ adsorbed at a tetrahedral site in the NiO bulk. The black circle highlights the Ni ion nearest to the adsorbed H+, which shows the largest electron transfer from the proton.

Extended Data Fig. 9 In-situ formation of a NiO overlayer on Ni thin film.

a-c, In situ TEM images and corresponding electron diffraction patterns of (a) air-formed native oxide on as-prepared Ni thin film, (b) complete removal of the native oxide by reducing the Ni thin film at 500 °C in ~0.67 Pa H2, and (c) formation of a NiO overlayer by oxidizing the clean Ni thin film at 400 °C in ~0.3 Pa O2, respectively. d, In-situ HRTEM images showing NiO growth during the exposure of Ni to ~0.3 Pa O2 at 400 °C.

Extended Data Fig. 10 “Blank beam” experiments for NiO reduction in CO and H2.

a, HRTEM snapshots of NiO before and after reduction at 400 °C in ~0.67 Pa CO, showing the formation of Ni islands (marked by dashed cyan circles). b, HRTEM snapshots of NiO before and after reduction at 400 °C in ~0.03 Pa H2. Dashed white lines represent the position and configuration of the outermost surface of the NiO at 0 s, showing NiO growth in the top-left corner region, while NiO shrinkage is observed in the left and top surface regions, with no surface metallization. The e-beam was blanked during CO and H2 exposure to minimize e-beam effects in (a, b). c, HRTEM snapshots of NiO at 400 °C in ~0.03 Pa H2, demonstrating the absence of surface metallization and presence of vacancy clusters (marked by dashed red circles) in the bulk, and NiO at 400 °C in ~0.67 Pa CO, revealing the presence of a large number of Ni islands (marked by dashed cyan circles), with the e-beam blanked. The inset images in (a, c) are the corresponding diffractograms of the HRTEM images, illustrating the formation of metallic Ni islands on NiO surfaces. d, HRTEM images of as-prepared NiO from O2 exposure at 400 °C and 450 °C, respectively. The same surface areas after vacuum annealing at 400 °C for 180 s, and at 450 °C for 515 s, respectively. In-situ HRTEM imaging confirms the high stability of NiO under vacuum annealing and continuous electron beam irradiation (e-beam dose rate: ~3.2 × 105 e/nm2 s), and that the NiO reduction observed in CO and H2 is induced by the reducing gases.

Supplementary information

Supplementary Information

Supplementary Figs. 1–5 and Table 1.

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Supplementary Video 1b

In situ TEM imaging of NiO reduction at 400 °C in approximately 0.03 Pa CO, viewed along the NiO [001] zone axis (Fig. 1a).

Supplementary Video 2b

In situ TEM imaging of NiO reduction at 400 °C in approximately 1 Pa CO, viewed along the NiO\([01\bar{1}]\) zone axis (Fig. 1c).

Supplementary Video 3

In situ TEM imaging of NiO reduction at 400 °C in approximately 0.016 Pa H2, viewed along the NiO [001] zone axis (Fig. 2a).

Supplementary Video 4

In situ TEM imaging of NiO reduction at 400 °C in approximately 0.08 Pa H2, viewed along the NiO [001] zone axis (Fig. 2c).

Supplementary Video 5

In situ TEM imaging of internal metallization during NiO reduction at 400 °C and approximately 0.04 Pa H2 (Extended Data Fig. 3a).

Supplementary Video 6

In situ TEM imaging of NiO reduction at 400 °C in approximately 1 × 10−3 Pa H2, viewed along the NiO [001] zone axis under a low electron dose rate (Extended Data Fig. 3e).

Supplementary Video 7

In situ TEM imaging of vacancy cluster formation in NiO under approximately 0.03 Pa H2 at 450 °C (Extended Data Fig. 5a,c).

Supplementary Video 8

In situ TEM imaging of the self-healing of vacancy clusters formed in NiO under approximately 0.03 Pa O2 at 450 °C (Extended Data Fig. 5b,d).

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Chen, X., Wang, J., Patel, S.B. et al. Atomic dynamics of gas-dependent oxide reducibility. Nature 644, 927–932 (2025). https://doi.org/10.1038/s41586-025-09394-0

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