Extended Data Fig. 10: Origin of WF gradient in SGraHIL.
From: Exciplex-enabled high-efficiency, fully stretchable OLEDs
a, Schematic illustration of SGraHIL. b, X-ray photoelectron spectroscopy depth profile of SGraHIL. P1 to P4 represent four positions with 0, 80, 120 and 200 s of sputter etching time, respectively. c, UV photoelectron spectroscopy measurement of SGraHIL at positions P1, P2, P3 and P4. d, Schematic illustration of conventional SHIL. e, UV photoelectron spectroscopy measurement of positions P1, P2 and P3. f, UV photoelectron spectroscopy measurement of SHIL at positions P1, P2 and P3. g, Correlation of WF and F1s atomic concentration profiles in terms of etching time (data extracted from b and c). h, Time-of-flight secondary ion mass spectrometry 3D mapping for [CH]−, [S]−, [SO3]− and [CF]− ions in SHIL and SGraHIL. SHIL, stretchable hole injection layer composed of PEDOT:PSS AI 4083 and Triton X-100; SGraHIL, stretchable gradient hole injection layer composed of PEDOT:PSS, PFSA and Triton X-100.
