Table 1 State-of-the-art Josephson junction reproducibility experimental results.

From: Wafer-scale uniformity improvement of Dolan-bridge Josephson junction by shadow evaporation bias correction

Paper

JJ type

Working area

JJ area, µm2

\(\:{\varvec{C}\varvec{V}}_{{\varvec{R}}_{\varvec{N}}}\), %

\(\:{\varvec{C}\varvec{V}}_{\varvec{A}}\), %

Optimization technique

37, 2023

Manhattan

27 cm2

0.06

4.5

Two-step shadow evap.

31, 2020

Manhattan

49 cm2

3.5

EBL optimization

30, 2024

Dolan

18 cm2

0.02–0.08

3.7–0.8

38, 2023

Manhattan

10 cm2

0.16

2.0

Oxidation optimization

32, 2024

Manhattan

52 cm2

0.04

7.0

6.0

Oxidation optimization

This work

Dolan

49 cm2

0.025–0.09

6.0–4.0

1.0–1.1

SEBi correction + oxidation

25 cm2

0.025–0.09

5.2–3.4

1.0–1.1

16 cm2

0.025–0.09

4.1–2.3

1.0–1.1