Table 1 Information on CHF3, C2H2F4, and CF4O used in the experiment (e.g., gas name, molecular weight, GWP 100 years, and CAS number).
From: Effect of C2H2F4/CF4O with low global warming potentials on SiNx etching as a CHF3 replacement
Gas name | Molecular formula | Molecular weight (g/mol) | GWP 100yr | CAS number |
|---|---|---|---|---|
Trifluoromethane (HFC-23) | CHF3 | 70.03 | 14,600 | 75-46-7 |
1,1,2,2-Tetrafluoroethane (HFC-134) | C2H2F4 (CHF2CHF2) | 102.03 | 1,430 | 359-35-3 |
Trifluoromethyl hypo fluorite | CF4O (CF3OF) | 104.004 | ~ 1 | 373-91-1 |
