Fig. 4 | Scientific Reports

Fig. 4

From: Recipe optimization and SRF test of Cu-compatible Nb\({}_{3}\)Sn films by DC magnetron sputtering from a stoichiometric target

Fig. 4

Niobium and tin atomic content percentage estimated via EDS for \(\textrm{Nb}{}_{3}\textrm{Sn}\) film samples deposited on NbBLs of different thickness (9 \(\upmu\)m, 30 \(\upmu\)m, 40 \(\upmu\)m) and bulk Nb. (a) Punctual measurements on the surface of the \(\textrm{Nb}{}_{3}\textrm{Sn}\) base film. The mean value horizontal lines correspond to 75.9 At% for Nb and 24.1 At% for Sn. (b) Punctual measurements on the island formations. The mean value horizontal lines correspond to 60.6 At% for Nb and 39.4 At% for Sn. The error bars indicate the instrumental uncertainty on the elemental quantification.

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