Table 1 Extracted values for the peak position, peak shift (with respect to the reference line) and peak full width half maximum (FWHM) for the three main peaks of \(\textrm{Nb}{}_{3}\textrm{Sn}\) samples deposited on NbBL-1, NbBL-30 and bulk Nb substrates at \({650}~^{\circ }\textrm{C}\).

From: Recipe optimization and SRF test of Cu-compatible Nb\({}_{3}\)Sn films by DC magnetron sputtering from a stoichiometric target

\(\downarrow\) Substrate

Position (\(^\circ\))

Shift (\(^\circ\))

FWHM (\(^\circ\))

(002)

(012)

(112)

(002)

(012)

(112)

(002)

(012)

(112)

Cu

33.6865

37.7724

41.5251

-0.1835

-0.2396

-0.2759

0.2387

0.2656

0.2697

NbBL-1

33.6964

37.7806

41.5388

-0.1736

-0.2314

-0.2622

0.2454

0.2590

0.2688

NbBL-10

33.7884

37.9183

41.6823

-0.0816

-0.0937

-0.1187

0.2233

0.2314

0.2476

NbBL-30

33.8242

37.9945

41.7764

-0.0458

-0.0175

-0.0246

0.2129

0.2330

0.2335

NbBL-40

33.8517

37.9956

41.7839

-0.0183

-0.0164

-0.0171

0.2207

0.2162

0.2407

Bulk Nb

33.8618

38.0196

41.8206

-0.0082

+0.0076

+0.0196

0.2357

0.2369

0.2459

Sapphire

33.8597

38.0108

41.8164

-0.0103

-0.0012

+0.0154

0.2146

0.2153

0.2295

Nb\({}_{3}\)Sn ref.

33.870

38.012

41.801

0

0

0

  1. The values in bold indicate the most intense peak. The reference values for \(\textrm{Nb}{}_{3}\textrm{Sn}\) are sourced from Refs. 20 and 23.