Table 2 Ta2O5 process parameters.

From: Reduction of absorption of Ta2O5 monolayers through the suppression of structural defects by employing an appropriate ionic oxygen concentration

Group

APS O2 flow rate (sccm)

Discharge current (A)

Bias voltage (V)

Kr #1 flow rate (sccm)

Kr #2 flow rate (sccm)

A

25

50

130

2

8

B

30

50

130

2

8

C

35

50

130

2

8

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