Table 1 Chemical composition and application procedures of the tested materials.

From: Comparison of retention of resin-based filled and unfilled pit and fissure sealants using different isolation techniques

 

Chemical Composition

Application Methods

Fissurit FX(Voco, Cuxhaven, Germany)[Highly filled pit and fissure sealant]

UDMA, Bis-GMA, Sodium fluoride, Methacrilic acid

Apply 35% orthophosphoric acid gel (Vococid, Voco, Cuxaven, Germany) etching gel 15–30 s; thoroughly rinse and dry. Apply Fissurit FX from the margin into the fissure and let penetrate for 15–20 s. Remove any air bubble. Light cure for 20–30 s and check the sealing.

TEETHMATE F1

(Kuraray, Okayama, Japan)

[unfilled pit and fissure sealant]

2-HEMA, TEGDMA, 10-MDP, MF-MMA copolymer, hydrophobic aromatic DMA, colloidal silica, dl-CQ, initiators, accelators, pigments or dyes, others

Apply 30% phosphoric acid (K-etchant gel, Kuraray Noritake, Tokyo, Japan) for 15–30 s; throughly rinse and dry. Apply Teethmate F1 from the margin into the fissure and let penetrate for 15–20 s. Remove any air bubble. Light cure for 20–30 s and check the sealing.

  1. *Bis-GMA: bisphenol A diglycidyl ether dimethacrylate; TEGDMA: triethylene glycol dimethacrylate; UDMA: urethane dimethacrylate; 2-HEMA: 2-Hydroxyethyl methacrylate, DUDMA: diurethane dimethacrylate; MF-MMA: methacryloylfluoride-methylmethacrylate copolymer; CQ: camphorquinone; 10-MDP: 10-Methacryloyloxydecyl dihydrogen phosphate.
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