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Self-supervised multi-resolution learning for label-agnostic morphology representation and clustering of semiconductor thin-film SEM defects
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  • Published: 03 April 2026

Self-supervised multi-resolution learning for label-agnostic morphology representation and clustering of semiconductor thin-film SEM defects

  • Umapathi Krishnamoorthy1,
  • Choon Kit Chan2,
  • Chandrakant Sonawane3,
  • Amol Vedpathak3,
  • Subhav Singh4,5 &
  • …
  • Deekshant Varsheny6,7 

Scientific Reports , Article number:  (2026) Cite this article

We are providing an unedited version of this manuscript to give early access to its findings. Before final publication, the manuscript will undergo further editing. Please note there may be errors present which affect the content, and all legal disclaimers apply.

Subjects

  • Engineering
  • Materials science
  • Mathematics and computing

Abstract

Scanning Electron Microscope (SEM) image analysis plays a vital role in semiconductor thin-film characterisation. In particular, defect detection and classification are performed using SEM images. However, conventional methods rely on labelled datasets or handcrafted features for classification, which limits their generalisation in real-world industrial inspection settings. The present work proposes a self-supervised multi-resolution learning framework for label-agnostic morphology representation learning and clustering of semiconductor thin-film defects. It uses a SEM image Dataset (4591 images) obtained from industrial wafer inspection. The framework starts with image pre-processing to remove acquisition artifacts. It employs a multi-resolution image pyramid for capturing surface morphologies at fine, intermediate, and coarse spatial scales. A shared-weight convolutional encoder that ensures alignment between embeddings across the three resolutions is trained (on an unlabelled dataset) and utilised for unsupervised defect morphology grouping. The framework learns morphological representations without defect labels. However, defect labels are used only for post-hoc evaluation by normalized mutual information (NMI) and visualization. Intrinsic clustering metrics and low-dimensional visualization are used to assess the algorithm’s efficacy. Experimental results reveal that the proposed method, gray level co-occurrence matrix (GLCM), local binary patterns (LBP), wavelet-based features, and principal component analysis (PCA) on raw pixels obtained a silhouette score of 0.50, 0.43, 0.31, 0.45, and 0.22, respectively. While normalized mutual information (NMI) values remained moderate across the models. These results reflect the label-agnostic nature of the proposed SSL framework. Further, UMAP and t-SNE visualizations confirm the coherent manifold structure and the effectiveness of morphology-driven grouping. These results demonstrate the robust, scale-invariant quality of the proposed self-supervised multi-resolution learning framework for defect clustering.

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Data availability

The data that support the findings of this study are openly available in [zenodo] at [https://zenodo.org/records/10715190](https:/zenodo.org/records/10715190) reference number24.

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Funding

Open access funding provided by Symbiosis International (Deemed University).

Author information

Authors and Affiliations

  1. Department of Electronics and Communication Engineering, KIT- Kalaignarkarunanidhi Institute of Technology, Coimbatore, Tamil Nadu, India

    Umapathi Krishnamoorthy

  2. Faculty of Engineering and Quantity Surveying, INTI International University, Nilai, Negeri Sembilan 71800, Malaysia

    Choon Kit Chan

  3. Department of Mechanical Engineering, Symbiosis International University, Pune, India

    Chandrakant Sonawane & Amol Vedpathak

  4. Division of research and development, lovely professional University, Phagwara, Punjab, India

    Subhav Singh

  5. Center for innovation and inclusive research, Sharda University, Greater Noida, Uttar Pradesh, India

    Subhav Singh

  6. Centre of Research Impact and Outcome, Chitkara University, Rajpura, 140417, Punjab, India

    Deekshant Varsheny

  7. Noida Institute of Engineering and Technology, 19, Knowledge Park-II, Institutional Area, Greater Noida, 201324, UP, India

    Deekshant Varsheny

Authors
  1. Umapathi Krishnamoorthy
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Contributions

U.K. conceived the study and contributed to the experimental design. C.K.C. assisted in methodology development and technical guidance. C.S. contributed to data analysis and interpretation of results. U.K and A.V. supervised the research work and coordinated the overall project. S.S. contributed to software work and validation of results. D.V. assisted in data collection, visualization, and manuscript preparation. All authors reviewed and approved the final manuscript.

Corresponding authors

Correspondence to Umapathi Krishnamoorthy or Amol Vedpathak.

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The authors declare no competing interests.

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Supplementary Information

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Supplementary Material 1 (download DOCX )

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Cite this article

Krishnamoorthy, U., Chan, C.K., Sonawane, C. et al. Self-supervised multi-resolution learning for label-agnostic morphology representation and clustering of semiconductor thin-film SEM defects. Sci Rep (2026). https://doi.org/10.1038/s41598-026-46947-3

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  • Received: 05 March 2026

  • Accepted: 28 March 2026

  • Published: 03 April 2026

  • DOI: https://doi.org/10.1038/s41598-026-46947-3

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Keywords

  • Defect clustering
  • Label-agnostic learning
  • Self-supervised learning
  • Process innovation
  • SEM analysis
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