Fig. 3: MoSERS microchip fabrication and SERS signal enhancement.

a Fabrication steps of the MoSERS microchip: (i) monolayer MoS₂ on Si/SiO₂ substrate (SEM image shows triangular monolayer MoS₂ domains; (ii) patterning using negative e-beam lithography with Man-2403 resist, followed by exposure and development; (iii) deposition of a TiO₂ as a back-reflector and a silver (Ag) layer (SEM image highlights the resist posts); and (iv) final hot liftoff step removes remaining resist, creating nanocavities (SEM image shown). b Schematic illustration of the MoSERS microchip during sample incubation and 532 nm laser illumination. c SERS intensity map of Rhodamine 6 G (R6G), comparing signals from flat regions (gray) and nanocavities (blue). d Comparison of average SERS peak intensities at 1650 cm−1, 1510 cm−1, and 1362 cm−1 for R6G collected from nanocavities (blue) and flat silver thin film areas (gray). e Sensitivity analysis of R6G on MoSERS substrate shows a linear detection range from 0.01 to 200 µM with an R² value of 0.97. f–j Representative SERS spectra for proteoliposome complexes including: (f) liposome only, (g) +egfr, (h) +αvβ5, (i) + DNA, and (j) α6β4-functional-zed proteoliposomes. k Principal Component Analysis (PCA) plot showing separation of classes along PC1 and PC2.