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Epitaxially grown single-crystalline antimony trioxide dielectrics for two-dimensional electronics

Abstract

Two-dimensional semiconductors require atomically thin high-dielectric-constant dielectrics to create scaled electronic devices. Several candidate materials possess features such as scalability, low interface trap density and good dielectric properties, but many of these require transfer, which can create defects, whereas traditional dielectrics are difficult to grow on the inert surface of two-dimensional materials. Here we report the van der Waals epitaxial growth of single-crystalline antimony trioxide (Sb2O3) on the two-dimensional semiconductors tungsten diselenide (WSe2) and molybendum disulfide (MoS2). Using a two-step process to decouple nucleation and epitaxy, unidirectional Sb2O3 domains are nucleated, grown and stitched to form single-crystal films with high uniformity within a growth time of less than 2 min. Monolayer Sb2O3 has a dielectric constant of 6, a breakdown field of ~11 MV cm−1 and a low interface trap density of 3.8 × 1010 cm−2 eV−1. Top-gate field-effect transistors using a monolayer Sb2O3/bilayer WSe2 heterostructure (equivalent oxide thickness, 0.4 nm) exhibit subthreshold swings of 62 mV dec−1, on/off ratios of 106 and low gate leakage currents of 10−4 A cm−2. We illustrate the scalability of the approach by creating 60 top-gate WSe2 transistor arrays with 95% yield, and complementary logic inverters with a maximum voltage gain of 13 at Vdd = 1 V.

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Fig. 1: vdW epitaxial growth of atomically thin single-crystal Sb2O3 film.
The alternative text for this image may have been generated using AI.
Fig. 2: Characterizations and growth mechanism of single-crystal Sb2O3.
The alternative text for this image may have been generated using AI.
Fig. 3: Dielectric properties of Sb2O3 single crystals.
The alternative text for this image may have been generated using AI.
Fig. 4: Electrical characterizations of a 6-nm-thick Sb2O3 for WSe2 top-gate FETs.
The alternative text for this image may have been generated using AI.
Fig. 5: Top-gated WSe2 FETs with sub-0.5-nm EOT.
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Fig. 6: Low-power FETs and logic gates based on Sb2O3/WSe2 heterostructures.
The alternative text for this image may have been generated using AI.

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Data availability

Source data are provided with this paper. The other data that support the findings of this study are available via Zenodo at https://doi.org/10.5281/zenodo.15245078 (ref. 82). The data that support the plots within this paper and other findings of this study are available from the corresponding authors upon reasonable request.

References

  1. Novoselov, K. S., Mishchenko, A., Carvalho, A. & Castro Neto, A. H. 2D materials and van der Waals heterostructures. Science 353, aac9439 (2016).

    Article  Google Scholar 

  2. Liu, C. et al. Two-dimensional materials for next-generation computing technologies. Nat. Nanotechnol. 15, 545–557 (2020).

    Article  Google Scholar 

  3. Novoselov, K. S. et al. Electric field effect in atomically thin carbon films. Science 306, 666–669 (2004).

    Article  Google Scholar 

  4. Radisavljevic, B., Radenovic, A., Brivio, J., Giacometti, V. & Kis, A. Single-layer MoS2 transistors. Nat. Nanotechnol. 6, 147–150 (2011).

    Article  Google Scholar 

  5. Wang, Q. H., Kalantar-Zadeh, K., Kis, A., Coleman, J. N. & Strano, M. S. Electronics and optoelectronics of two-dimensional transition metal dichalcogenides. Nat. Nanotechnol. 7, 699–712 (2012).

    Article  Google Scholar 

  6. Ma, L., Wang, Y. & Liu, Y. van der Waals contact for two-dimensional transition metal dichalcogenides. Chem. Rev. 124, 2583–2616 (2024).

    Article  Google Scholar 

  7. Shen, P. C. et al. Ultralow contact resistance between semimetal and monolayer semiconductors. Nature 593, 211–217 (2021).

    Article  Google Scholar 

  8. Shen, Y. et al. Two-dimensional-materials-based transistors using hexagonal boron nitride dielectrics and metal gate electrodes with high cohesive energy. Nat. Electron. 7, 856–867 (2024).

    Article  Google Scholar 

  9. Hu, J. et al. Low-cost preparation of wafer-scale Au(111) single crystals for the epitaxy of two-dimensional layered materials. ACS Nano 19, 4973–4982 (2025).

    Article  Google Scholar 

  10. The International Roadmap for Devices and Systems: a beacon for the electronics industry. Comput. https://doi.org/10.1109/MC.2022.3174253 (2022).

  11. Li, W. et al. Uniform and ultrathin high-κ gate dielectrics for two-dimensional electronic devices. Nat. Electron. 2, 563–571 (2019).

    Article  Google Scholar 

  12. Kim, J. et al. All-solution-processed van der Waals heterostructures for wafer-scale electronics. Adv. Mater. 34, e2106110 (2022).

    Article  Google Scholar 

  13. Yang, W. et al. The integration of sub-10 nm gate oxide on MoS2 with ultra low leakage and enhanced mobility. Sci. Rep. 5, 11921 (2015).

    Article  Google Scholar 

  14. Qian, Q. et al. Enhanced dielectric deposition on single-layer MoS2 with low damage using remote N2 plasma treatment. Nanotechnology 28, 175202 (2017).

    Article  Google Scholar 

  15. Yang, J. et al. Improved growth behavior of atomic-layer-deposited high-k dielectrics on multilayer MoS2 by oxygen plasma pretreatment. ACS Appl. Mater. Interfaces 5, 4739–4744 (2013).

    Article  Google Scholar 

  16. Kropp, J. A., Sharma, A., Zhu, W., Ataca, C. & Gougousi, T. Surface defect engineering of MoS2 for atomic layer deposition of TiO2 Films. ACS Appl. Mater. Interfaces 12, 48150–48160 (2020).

    Article  Google Scholar 

  17. Huang, J. K. et al. High-κ perovskite membranes as insulators for two-dimensional transistors. Nature 605, 262–267 (2022).

    Article  Google Scholar 

  18. Zhang, C. et al. Single-crystalline van der Waals layered dielectric with high dielectric constant. Nat. Mater. 22, 832–837 (2023).

    Article  Google Scholar 

  19. Luo, P. et al. Molybdenum disulfide transistors with enlarged van der Waals gaps at their dielectric interface via oxygen accumulation. Nat. Electron. 5, 849–858 (2022).

    Article  Google Scholar 

  20. Chen, T. A. et al. Wafer-scale single-crystal hexagonal boron nitride monolayers on Cu (111). Nature 579, 219–223 (2020).

    Article  Google Scholar 

  21. Liu, Y., Huang, Y. & Duan, X. Van der Waals integration before and beyond two-dimensional materials. Nature 567, 323–333 (2019).

    Article  Google Scholar 

  22. Britnell, L. et al. Electron tunneling through ultrathin boron nitride crystalline barriers. Nano Lett. 12, 1707–1710 (2012).

    Article  Google Scholar 

  23. Laturia, A., Van de Put, M. L. & Vandenberghe, W. G. Dielectric properties of hexagonal boron nitride and transition metal dichalcogenides: from monolayer to bulk. npj 2D Mater. Appl. 2, 6 (2018).

  24. Zhu, C. Y. et al. Magnesium niobate as a high-κ gate dielectric for two-dimensional electronics. Nat. Electron. 7, 1137–1146 (2024).

    Article  Google Scholar 

  25. Zhu, W. et al. Ternary VOCl single-crystal as efficient gate dielectric for 2D field-effect transistors. 2D Mater. 8, 025010 (2020).

    Article  Google Scholar 

  26. Xu, W. et al. Single-crystalline high-κ GdOCl dielectric for two-dimensional field-effect transistors. Nat. Commun. 15, 9469 (2024).

    Article  Google Scholar 

  27. Guo, Y. et al. Van der Waals polarity-engineered 3D integration of 2D complementary logic. Nature 630, 346–352 (2024).

    Article  Google Scholar 

  28. Shi, Z. et al. Rapid growth of inch-sized lanthanide oxychloride single crystals. Nat. Mater. 24, 852–860 (2025).

  29. Zhang, Y. et al. A single-crystalline native dielectric for two-dimensional semiconductors with an equivalent oxide thickness below 0.5 nm. Nat. Electron. 5, 643–649 (2022).

    Article  Google Scholar 

  30. Chen, J. et al. Vertically grown ultrathin Bi2SiO5 as high-κ single-crystalline gate dielectric. Nat. Commun. 14, 4406 (2023).

    Article  Google Scholar 

  31. Yin, L. et al. High-κ monocrystalline dielectrics for low-power two-dimensional electronics. Nat. Mater. 24, 197–204 (2024).

    Article  Google Scholar 

  32. Zeng, D. et al. Single-crystalline metal-oxide dielectrics for top-gate 2D transistors. Nature 632, 788–794 (2024).

    Article  Google Scholar 

  33. Liu, K. et al. A wafer-scale van der Waals dielectric made from an inorganic molecular crystal film. Nat. Electron. 4, 906–913 (2021).

    Article  Google Scholar 

  34. Messalea, K. A. et al. High-k 2D Sb2O3 made using a substrate-Independent and low-temperature liquid-metal-based process. ACS Nano 15, 16067–16075 (2021).

    Article  Google Scholar 

  35. Han, W. et al. Two-dimensional inorganic molecular crystals. Nat. Commun. 10, 4728 (2019).

    Article  Google Scholar 

  36. Xu, Y. et al. Scalable integration of hybrid high-k dielectric materials on two-dimensional semiconductors. Nat. Mater. 22, 1078–1084 (2023).

    Article  Google Scholar 

  37. Ryu, H. et al. Van der Waals epitaxially grown molecular crystal dielectric Sb2O3 for 2D electronics. ACS Nano 18, 13098–13105 (2024).

    Article  Google Scholar 

  38. Wang, D. et al. A single-crystal antimony trioxide dielectric for 2D field-effect transistors. Small 21, 2402689 (2024).

    Article  Google Scholar 

  39. Liao, J. et al. Dielectric-assisted transfer using single-crystal antimony oxide for two-dimensional material devices. Nat. Electron. 8, 309–321 (2025).

  40. Liu, L. et al. Van der Waals epitaxial growth of single-crystal molecular film. Natl Sci. Rev. 11, nwae358 (2024).

    Article  Google Scholar 

  41. Zhang, Z. et al. Ultrafast growth of large single crystals of monolayer WS2 and WSe2. Natl Sci. Rev. 7, 737–744 (2020).

    Article  Google Scholar 

  42. Zhang, Z. et al. Endoepitaxial growth of monolayer mosaic heterostructures. Nat. Nanotechnol. 17, 493–499 (2022).

    Article  Google Scholar 

  43. Huang, Z. et al. Terminal atom-controlled etching of 2D-TMDs. Adv. Mater. 35, 2211252 (2023).

    Article  Google Scholar 

  44. Wang, J. et al. Dual-coupling-guided epitaxial growth of wafer-scale single-crystal WS2 monolayer on vicinal a-plane sapphire. Nat. Nanotechnol. 17, 33–38 (2021).

    Article  Google Scholar 

  45. Zhang, Z. et al. Robust epitaxial growth of two-dimensional heterostructures, multiheterostructures, and superlattices. Science 357, 788–792 (2017).

    Article  Google Scholar 

  46. Bouchet, D., Roy, E. & Yu-Zhang, K. TEM and EELS studies of electrodeposited antimony nanowires. Eur. Phys. J. Appl. Phys. 30, 193–199 (2005).

    Article  Google Scholar 

  47. Ranjan, A., Zeng, L. & Olsson, E. Dielectric breakdown mechanisms in high-κ antimony trioxide (Sb2O3). ACS Appl. Electron. Mater 6, 8540–8548 (2024).

    Article  Google Scholar 

  48. Das, S. et al. Transistors based on two-dimensional materials for future integrated circuits. Nat. Electron. 4, 786–799 (2021).

    Article  Google Scholar 

  49. Liao, M. et al. UItra-low friction and edge-pinning effect in large-lattice-mismatch van der Waals heterostructures. Nat. Mater. 21, 47–53 (2021).

    Article  Google Scholar 

  50. Liu, F. et al. Determination of the preferred epitaxy for III-nitride semiconductors on wet-transferred graphene. Sci. Adv. 9, eadf8484 (2023).

    Article  Google Scholar 

  51. Kim, H. K., Yu, I.-H., Lee, J. H., Park, T. J. & Hwang, C. S. Scaling of equivalent oxide thickness of atomic layer deposited HfO2 film using RuO2 electrodes suppressing the dielectric dead-layer effect. Appl. Phys. Lett. 101, 172910 (2012).

  52. Stengel, M. & Spaldin, N. A. Origin of the dielectric dead layer in nanoscale capacitors. Nature 443, 679–682 (2006).

    Article  Google Scholar 

  53. Muller, D. et al. The electronic structure at the atomic scale of ultrathin gate oxides. Nature 399, 758–761 (1999).

  54. Ben-Sasson, A. J., Ankonina, G., Greenman, M., Grimes, M. T. & Tessler, N. Low-temperature molecular vapor deposition of ultrathin metal oxide dielectric for low-voltage vertical organic field effect transistors. ACS Appl. Mater. Interfaces 5, 2462–2468 (2013).

    Article  Google Scholar 

  55. Lu, Z. et al. Wafer-scale high-k dielectrics for two-dimensional circuits via van der Waals integration. Nat. Commun. 14, 2340 (2023).

    Article  Google Scholar 

  56. Li, T. et al. A native oxide high-κ gate dielectric for two-dimensional electronics. Nat. Electron. 3, 473–478 (2020).

    Article  Google Scholar 

  57. Fan, X. et al. 2D edge-seeded heteroepitaxy of ultrathin high-κ dielectric CaNb2O6 for 2D field-effect transistors. Nat. Commun. 16, 2585 (2025).

    Article  Google Scholar 

  58. Jin, Y. et al. Controllable oxidation of ZrS2 to prepare high-k, single-crystal m-ZrO2 for 2D electronics. Adv. Mater. 35, e2212079 (2023).

    Article  Google Scholar 

  59. Zavabeti, A. et al. A liquid metal reaction environment for the room-temperature synthesis of atomically thin metal oxides. Science 358, 332–335 (2017).

    Article  Google Scholar 

  60. Lee, B. H., Jeon, Y., Zawadzki, K., Qi, W. J. & Lee, J. Effects of interfacial layer growth on the electrical characteristics of thin titanium oxide films on silicon. Appl. Phys. Lett. 74, 3143 (1999).

    Article  Google Scholar 

  61. Kang, T. et al. High-κ dielectric (HfO2)/2D semiconductor (HfSe2) gate stack for low-power steep-switching computing devices. Adv. Mater. 36, e2312747 (2024).

    Article  Google Scholar 

  62. Li, S., Liu, X., Yang, H., Zhu, H. & Fang, X. Two-dimensional perovskite oxide as a photoactive high-κ gate dielectric. Nat. Electron. 7, 216–224 (2024).

    Article  Google Scholar 

  63. Illarionov, Y. Y. et al. Ultrathin calcium fluoride insulators for two-dimensional field-effect transistors. Nat. Electron. 2, 230–235 (2019).

    Article  Google Scholar 

  64. Wang, L. et al. A general one-step plug-and-probe approach to top-gated transistors for rapidly probing delicate electronic materials. Nat. Nanotechnol. 17, 1206–1213 (2022).

    Article  Google Scholar 

  65. Li, L. et al. Ultrathin van der Waals lanthanum oxychloride dielectric for 2D field-effect transistors. Adv. Mater. 37, 2309296 (2025).

  66. Park, J. H. et al. Atomic layer deposition of Al2O3 on WSe2 functionalized by titanyl phthalocyanine. ACS Nano 10, 6888–6896 (2016).

    Article  Google Scholar 

  67. Yi, K. et al. Integration of high-κ native oxides of gallium for two-dimensional transistors. Nat. Electron. 7, 1126–1136 (2024).

    Article  Google Scholar 

  68. Ranjan, A., Zeng, L. & Olsson, E. Electrodes for high-κ molecular crystal antimony trioxide gate dielectrics for 2D electronics. Adv. Electron. Mater. 10, 2400205 (2024).

    Article  Google Scholar 

  69. Kresse, G. & Furthmüller, J. Efficient iterative schemes for ab initio total-energy calculations using a plane-wave basis set. Phys. Rev. B 54, 11169 (1996).

    Article  Google Scholar 

  70. Perdew, J. P., Burke, K. & Ernzerhof, M. Generalized gradient approximation made simple. Phys. Rev. Lett. 77, 3865 (1996).

    Article  Google Scholar 

  71. Grimme, S., Ehrlich, S. & Goerigk, L. Effect of the damping function in dispersion corrected density functional theory. J. Comput. Chem. 32, 1456–1465 (2011).

    Article  Google Scholar 

  72. Moellmann, J. & Grimme, S. DFT-D3 study of some molecular crystals. J. Phys. Chem. C 118, 7615–7621 (2014).

    Article  Google Scholar 

  73. Mills, G., Jónsson, H. & Schenter, G. K. Reversible work transition state theory application to dissociative adsorption of hydrogen. Surf. Sci. 324, 305–337 (1995).

    Article  Google Scholar 

  74. Bussi, G., Donadio, D. & Parrinello, M. Canonical sampling through velocity rescaling. J. Chem. Phys. 126, 014101 (2007).

    Article  Google Scholar 

  75. Lippert, B. G., Hutter, J. & Parrinello, M. A hybrid Gaussian and plane wave density functional scheme. Mol. Phys. 92, 477–488 (1997).

    Article  Google Scholar 

  76. Goedecker, S., Teter, M. & Hutter, J. Separable dual-space Gaussian pseudopotentials. Phys. Rev. B 54, 1703 (1996).

    Article  Google Scholar 

  77. Grimme, S., Antony, J., Ehrlich, S. & Krieg, H. A consistent and accurate ab initio parametrization of density functional dispersion correction (DFT-D) for the 94 elements H-Pu. J. Chem. Phys. 132, 154104 (2010).

    Article  Google Scholar 

  78. Kuhne, T. D. et al. CP2K: an electronic structure and molecular dynamics software package—quickstep: efficient and accurate electronic structure calculations. J. Chem. Phys. 152, 194103 (2020).

    Article  Google Scholar 

  79. Lu, T. & Chen, F. Multiwfn: a multifunctional wavefunction analyzer. J. Comput. Chem. 33, 580–592 (2012).

    Article  Google Scholar 

  80. Lu, T. A comprehensive electron wavefunction analysis toolbox for chemists, multiwfn. J. Chem. Phys. 161, 082503 (2024).

    Article  Google Scholar 

  81. Momma, K. & Izumi, F. VESTA 3 for three-dimensional visualization of crystal, volumetric and morphology data. J. Appl. Crystallogr. 44, 1272–1276 (2011).

    Article  Google Scholar 

  82. Zhang, Z. et al. Supplementary video. Zenodo https://doi.org/10.5281/zenodo.15245078 (2025).

  83. Lai, S. et al. HfO2/HfS2 hybrid heterostructure fabricated via controllable chemical conversion of two-dimensional HfS2. Nanoscale 10, 18758–18766 (2018).

    Article  Google Scholar 

  84. Gusev, E. P. et al. Ultrathin high-K gate stacks for advanced CMOS devices. In International Electron Devices Meeting (IEDM). Technical Digest (Cat. No.01CH37224) 20.1.1–20.1.4 (IEEE, 2001).

  85. Natarajan, S. et al. A 14nm logic technology featuring 2nd-generation FinFET, air-gapped interconnects, self-aligned double patterning and a 0.0588 µm2 SRAM cell size. In 2014 IEEE International Electron Devices Meeting (IEDM) 3.7.1–3.7.3 (IEEE, 2014).

  86. Liu, H. & Peide, D. Y. MoS2 dual-gate MOSFET With atomic-layer-deposited Al2O3 as top-gate dielectric. IEEE Electron. Dev. Lett. 33, 546–548 (2012).

    Article  Google Scholar 

  87. Zou, X. et al. Interface engineering for high-performance top-gated MoS2 field-effect transistors. Adv. Mater. 26, 6255–6261 (2014).

    Article  Google Scholar 

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Acknowledgements

This work was supported by the National Key R&D Program of the Ministry of Science and Technology of China (grant number 2022YFA1203801 to X.D.); National Natural Science Foundation of China (grant numbers 52221001, 52372145, 22422104 and 62404079 to X.D., J.L. and R.W.); the Open Research Fund of Suzhou Laboratory (number SZLAB-1508-2024-TS013 to X.D.); the Natural Science Foundation of Hunan Province (grant number 2023JJ20009, 2025JJ40050 and 2024JJ6135 to J.L. and R.W.); the Hunan Province ‘Huxiang Talents’ Project (grant number 2023RC3092 to J.L.); and the Natural Science Foundation of Chongqing, China (grant number cstc2021jcyj-msxmX0321 to J.L.). The STEM characterization was performed at the Analytical Instrumentation Center of Hunan University. The funders had no role in the study design, data collection and analysis, decision to publish or preparation of the manuscript.

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R.W., J.L. and X.D. designed the research and supervised the project. Zimei Zhang synthesized the vdW heterostructures and performed the device fabrication, electrical measurements and analysis. Zhengwei Zhang, M.Z.S., M.L., D.S., Zucheng Zhang and M.Z. performed the C-AFM, AFM and TEM characterizations and contributed to the discussions. Zhengwei Zhang, S.L., P.L., X.L., F.D., Y.C., W.X., M.J. and D.L. conducted the growth experiments of TMDs. J.T., L.C., W.D. and R.W. performed the electrical measurements. Zimei Zhang, Zhengwei Zhang and B.Q. conducted the theoretical calculations and wrote the related discussions. Zimei Zhang, R.W., J.L. and X.D. co-wrote the manuscript with inputs from all authors. B.L. revised the manuscript. All authors discussed the results and commented on the manuscript.

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Correspondence to Ruixia Wu, Jia Li or Xidong Duan.

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Nature Electronics thanks Alok Ranjan, Hyeon-Jin Shin and the other, anonymous, reviewer(s) for their contribution to the peer review of this work.

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Supplementary Figs. 1–37, Table 1 and Note 1.

Supplementary video 1 (download MP4 )

Thermal relaxation process of single-crystal Sb2O3 on WSe2 at 0° orientation. The simulation results demonstrate that domains with initial angles of 0° undergo in-plane sliding and rotation before eventually returning to the 0° configuration, which represents the most energetically stable state.

Supplementary video 2 (download MP4 )

Thermal relaxation process of single-crystal Sb2O3 on WSe2 at 60° orientation. The simulation results demonstrate that domains with initial angles of 60° undergo in-plane sliding and rotation before eventually returning to the 0° configuration, which represents the most energetically stable state.

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Zhang, Z., Zhang, Z., Saeed, M.Z. et al. Epitaxially grown single-crystalline antimony trioxide dielectrics for two-dimensional electronics. Nat Electron 9, 367–378 (2026). https://doi.org/10.1038/s41928-026-01580-w

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