Fig. 10: Coalescence of carbon dots upon annealing forms an atomically thin quasi-2D amorphous carbon film.
From: Ultrathin quasi-2D amorphous carbon dielectric prepared from solution precursor for nanoelectronics
a Schematic illustrating the proposed thermal decomposition and crosslinking mechanism. TGA-MS spectrograms of the functionalized carbon dots obtained with temperature either slowly increased from room temperature to 800 °C with a low ramping rate of 10 oC min−1 (b) or rapidly increased to 500 °C with a fast-ramping rate of 100 °C min−1 followed by holding at 500 °C for 20 min to mimic the film preparation conditions (c). MS intensities of the dominant volatile decomposition products are assigned to CO2 (black), CON* (red), and H2 (blue) based on their different mass-to-charge (m/z) ratios.
