Fig. 1: Metal-mask free AlN microresonator fabrication.
From: Simplified aluminum nitride processing for low-loss integrated photonics and nonlinear optics
a Simulation result of the mode profile for a partially-etched ring microresonator (~800 nm etching depth). b AFM image of a single crystalline AlN-on-sapphire sample with a 250-nm-thick Si3N4 mask on top. c Fabrication flow for the AlN process. d SEM image of an AlN waveguide. e FIB-SEM cross section of the coupling region between ring and waveguide.
