The film stabilities of ω-N-(3-(dimethylamino)propyl)propylamide-terminated polystyrene (PS-N) and conventional polystyrene (PS-H) on SiOx substrates were examined. Whereas a 20-nm-thick PS-H film was dewet at 423 K, a comparable PS-N film was stable because of the interaction between the chain end and the substrate surface. This indicates that end functionalization affects chain mobility with a relatively large scale at the solid interface.
- Shinichiro Shimomura
- Manabu Inutsuka
- Keiji Tanaka
