Our approach concerning a photo-based patterning for general purpose polymer films is described. Patterned UV light irradiation of a thin polystyrene film under controlled temperature generates surface relief structures by mass transfer from shaded to irradiated areas. The resulting surface relief structure can be arbitrarily erased by heating and reconstructed by patterned ultraviolet (UV) light irradiation, and this process is repeatable. This new method thus enables fabrication of dynamic reversible patterning structures from various general polymers.
- Takashi Ubukata
- Yusuke Moriya
- Yasushi Yokoyama
