Abstract
This study presents dual-mode memory transistor that accommodates memory and synaptic operations utilizing photoinduced charge trapping at the interface between poly(1,4-butanediol diacrylate) (pBDDA) and Parylene dielectric layer. Memory characteristics were implemented based on the photoresponsivity of dinaphtho[2,3-b:2′,3′-f]thieno[3,2-b]thiophene (DNTT), enabling instantaneous electron storage under combined optical and electrical inputs, with retention times up to 10,000 s. Meanwhile, synaptic characteristics were induced by gradual charge trapping via optical pulse stimulation. Synaptic plasticity was confirmed via the potentiation–depression curve, emulating key features of biological nervous system, namely short-term memory (STM) and long-term memory (LTM). Furthermore, the fingerprint recognition tasks highlighted identification and authentication abilities by incorporating our synaptic function into an artificial neural network (ANN). The dual-mode memory transistor, fabricated on a business card, showed excellent compatibility with flexible optoelectronics, maintaining stable memory and synaptic performance over 500 bending cycles with minimal changes in memory window, memory ratio, and potentiation–depression behavior.
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Introduction
Light is widely used for various functionalities: emission, detection, and energy conversion. The interaction between light and materials has been extensively explored to develop advanced electronic and optoelectronic devices, contributing to innovations in display technology1,2,3, sensing systems4,5, and energy harvesting6,7,8. Light emitting diodes (LEDs) and laser diodes contribute to foundational components in modern lighting and optical communication systems, offering highly efficient light generation and control while photodiodes and complementary metal-oxide-semiconductor (CMOS) sensors provide imaging technologies, enabling high-resolution detection across a range of applications9,10,11,12. Solar cells and photoelectrochemical systems offer light to drive sustainable energy conversion processes, advancing the frontiers of optoelectronics and renewable energy technologies13,14. Clear advantages why light has gained prominence in the aforementioned modern electronic devices and has become a key enabler of technological advancements are as follows: Light propagates without electrical resistance, enabling lossless signal and energy transmission. It also offers fast yet low-power15, high spatial resolution16,17, and wavelength tunability18,19.
Meanwhile, optoelectronic synapse devices offer a transformative approach to neuromorphic computing by means of optical signals to replicate synaptic behavior with superior speed, energy efficiency, and parallelism. In conventional electronic synapses, their operation depends on localized electrical pulses for signal transmission20,21,22, photonic synapses capitalize on light-driven carrier dynamics to achieve synaptic modulation23,24,25. Through simultaneous optical excitation, these devices enable highly efficient optical potentiation and either optical or electrical depression, substantially reducing energy dissipation and improving signal fidelity26,27,28. Critically, whereas voltage-driven synapses operate on a one-to-one basis, photonic synapses uniquely exploit the spatial distribution of light to induce global modulation across multiple interconnected synapses. This capability facilitates synchronized weight adjustment throughout a neural network, enhancing parallel processing and scalability far beyond what is achievable with traditional electronic counterparts. By harnessing the intrinsic advantages of light, such as its resistance-free propagation, ultra-fast response, and inherent multiplexing capability, photonic synapses establish a compelling foundation for next-generation neuromorphic architectures.
Operating a synapse with light requires the functionality to retain stimulation induced by optical pulses, ensuring that synaptic states persist beyond the transient light input29,30,31. This requirement underscores the need for an intrinsic optical memory function, where the material system effectively captures and modulates synaptic weights in response to prior light exposure32,33. Such functionality can be realized through optically induced charge trapping, persistent photoconductivity34,35, photogating36,37, or phase-change mechanisms38,39, each offering a pathway to long-term plasticity and adaptive learning. In this context, chemical vapor deposition (CVD)-synthesized polymer insulators enable the formation of conformal layers, offering precise control over thin-film uniformity40,41. By sequentially depositing distinct polymers via CVD to create bilayer structures, tailored interfaces can be engineered to serve as trap sites for optically generated carriers42,43. This approach presents a viable strategy for long-term charge retention in photonic synapses, providing controlled energy landscapes at the polymer junction to enhance optical memory functionality.
Recently, several studies have investigated memory or synaptic devices that utilize the charge trapping effect in bilayer dielectric structures42,44,45. For example, Chen et al. reported optically operated nonvolatile memory transistors based on a photoactive hybrid bilayer dielectric composed of a self-assembled monolayer (SAM) of photochromic diarylethenes (DAEs) and an ultrathin solution-processed hafnium oxide43. However, these studies have demonstrated only either memory or synaptic characteristics, not both. This paper presents a single memory transistor that is capable of presenting both memory and synaptic characteristics, by utilizing a charge trapping effect at the interface between poly(1,4-butanediol diacrylate) (pBDDA) and Parylene. By controlling the light or electrical signal applied to the device, we were able to selectively implement either of the two different behaviors. Simultaneous input of light and gate voltage bias (VG) led to memory operation. For synaptic behavior, optical and VG pulses were independently applied to the device, resulting in progressive charge accumulation and detrapping from the pBDDA/Parylene interface, respectively. Noticeably, our proposed device was fabricated on a paper-based business card, verifying the exceptional compatibility with flexible optoelectronics. During a bending test for 500 cycles, memory characteristics including memory window, memory ratio, and retention characteristics were preserved. Furthermore, fingerprint recognition also remained reliable, with a minimal accuracy change of 4.49%, despite the repetitive mechanical deformation.
Results
Flexible dual-mode synaptic device based on a bilayer dielectric structure
Figure 1a shows the structure of the proposed dual-mode device fabricated on a flexible business card substrate, which provides both memory and synaptic functions within a single device. The device with a bottom-gate, top-contact (BGTC) geometry features bilayer dielectric structure where pBDDA and Parylene were employed as a blocking dielectric layer (BDL) and tunneling dielectric layer (TDL), respectively, and dinaphtho[2,3-b:2′,3′-f]thieno[3,2-b]thiophene (DNTT) was utilized as a channel layer. Both dielectric layers were fabricated by using CVD processes to enable the consecutive deposition of high-purity polymer dielectric films. Among them, the pBDDA layer was deposited via an initiated chemical vapor deposition (iCVD), an all-dry process that enables the formation of high-purity polymer thin films without the use of solvents or additives46. The iCVD process involves in-situ free-radical polymerization occurring at the substrate surface, which allows for the conformal and uniform deposition of highly crosslinked polymeric films even at ultrathin thicknesses40. Given its low processing temperature with the substrate maintained near room temperature throughout the process, this technique is suitable for thermally vulnerable flexible substrates, such as business cards. The resulting pBDDA film, with its highly crosslinked polymer network, exhibited excellent insulating properties, including extremely low leakage current and high breakdown field42. These characteristics effectively suppress gate leakage and prevent dielectric breakdown under programming conditions. For these reasons, pBDDA serves as an ideal BDL material in memory transistors, ensuring reliable operation and improved stability under repeated high-voltage stress. Meanwhile, Parylene was employed as the TDL, as it has been widely used in electronic devices due to its excellent electrical properties47,48. In particular, its compatibility with the CVD process allows for effective suppression of both bulk and interface trap densities, and facilitates the formation of a well-defined bilayer structure by preventing intermixing between dielectric layers. The cross-sectional scanning electron microscope (SEM) image confirmed that pBDDA and Parylene were deposited in a layer-by-layer structure with thicknesses of 300 and 50 nm, respectively (Fig. 1b). Fourier transform infrared (FT-IR) spectra of pBDDA and 1,4-butanediol diacrylate (BDDA) are shown in Supplementary Fig. 1. The peak at the wavenumber ranging from 1650 to 1606 cm−1 corresponding to the C\(=\)C stretch of the vinyl bond, disappeared in the FT-IR spectrum of pBDDA in comparison to that of BDDA. Meanwhile, the peaks at 1719 and 1179 cm−1, which correspond to the C=O and C−O−C bonds, respectively, were fully preserved in the FT-IR spectrum of pBDDA. The FT-IR analysis suggested that free-radical polymerization was successfully achieved by the iCVD process while maintaining functional groups in the monomer species.
a Schematic illustration of the dual-mode device fabricated on a business card. b Cross-sectional SEM image of the device. c Energy band diagram of DNTT, indicating the Fermi level, HOMO, LUMO, and optical band gap. d Schematic representation of the input-dependent memory and synaptic operations induced by charge trapping at the interface between pBDDA and Parylene of the dual-mode device.
To investigate the optical properties and energy band structure of DNTT, which plays an important role in generating the carriers for both memory and synaptic functions, ultraviolet-visible (UV-vis) spectroscopy analysis was performed. As shown in Supplementary Fig. 2a, DNTT exhibited strong absorption at the wavelength of 471 nm and the corresponding optical band gap was determined to be 2.62 eV from the Tauc plot (Supplementary Fig. 2b). Additionally, the secondary cut-off and valence band edges of DNTT were measured to be 16.99 and 0.73 eV, respectively, in the ultraviolet photoelectron spectroscopy (UPS) analysis (Supplementary Fig. 2c). According to the UV-vis and UPS analyses, the energy band diagram of DNTT was determined, with a Fermi level of −4.21 eV, a lowest unoccupied molecular orbital (LUMO) of −2.32 eV, and a highest occupied molecular orbital (HOMO) of −4.94 eV (Fig. 1c). Based on the energy band structure of DNTT, we utilized blue light to induce the photoresponse of DNTT, thereby facilitating the photoinduced charge trapping effect. The bilayer dielectric stack in the dual-mode device also enabled this charge trapping behavior in which the photogenerated electrons in DNTT are stored at the interface between pBDDA and Parylene through tunneling, successfully realizing two different types of optoelectronic applications: memory and synaptic characteristics (Fig. 1d). The combined optical and electrical signals allowed for the charge storage by instantaneously accumulating significant amounts of charge carriers, leading to the memory characteristics. On the other hand, synaptic behavior was demonstrated with gradual charge accumulation by optical pulses.
Memory operation of a dual-mode device via simultaneous optical and electrical inputs
The memory operation of the dual-mode device was achieved through the accumulation of photogenerated carriers at the interface of the bilayer dielectric, with the assistance of an electrical signal, as shown in Fig. 2a. For programming operation, both VG and light with wavelength of 455 nm were applied simultaneously to the device. The transfer curve was shifted toward positive VG direction by applying VG of 50 V and a light intensity of 0.19 mW∙cm−2 for 2 s (Fig. 2b). The programmed state (P-state) was enabled by charge trapping of photogenerated electrons, and this interpretation was supported by the observation that only a marginal shift in the transfer curves occurred when either electrical or optical input was applied separately (Supplementary Fig. 3). Meanwhile, only a VG was used for erasing operation, without the need of photoinduced carrier generations. The erased state (E-state) was attained by applying a VG of −50 V for 2 s to the programmed dual-mode device, which is practically identical to the initial state (I-state) (Fig. 2b). For a quantitative analysis of the memory characteristics, the memory window was calculated using the following equation:
where \({V}_{p}\) and \({V}_{i}\) refer to the VG values corresponding to the pre-defined drain current value (ID = 1 nA) in the P-state and I-state, respectively. The memory window obtained by the combined VG and light input signals was 11 V (Fig. 2c). On the contrary, when using only voltage input or only light input, the memory window was limited to 1 V and 2 V, respectively. In other words, both electrical and optical signals are required to achieve sufficient memory window, which is fully consistent with our interpretation on charge trapping behavior of the photogenerated electrons. Moreover, the charge storage capability was demonstrated due to the distinctive properties of pBDDA/Parylene bilayer dielectric structure, eliminating the need for an additional charge trapping layer, which is beneficial for simplifying the device structure.
a Schematic representation of memory operation of the dual-mode device using both light and electrical input signals. b The change in transfer curves depending on programming and erasing operation where the VD was fixed at −10 V. c The change in memory window according to programming conditions. The programming operation was performed by applying light intensity of 0.19 mW∙cm−2 and/or VG of 50 V to the device. d VG-dependent and e light intensity-dependent programming operation and memory window of the device. f The change in ID in P- and I-states with respect to time at VG of 0 V. The VG and VD values were fixed at 0 and −10 V, respectively. g Energy band diagrams for programming operations by separately applying VG (left) and light (right). h Energy band diagram for programming operation by using both VG and light.
The tunability of the memory window was further investigated by adjusting the applied VG and light intensity. When VG applied to the device varied from 12.5 to 50 V in 12.5 V step at the fixed light intensity of 0.19 mW∙cm−2, the transfer curves were gradually shifted with the increasing VG (Fig. 2d). The memory windows were measured to 5, 7, 8, and 11 V according to the applied VG values of 12.5, 25, 37.5, and 50 V, respectively, in the programming operation. Similarly, the memory window continuously increased from 7 to 11 V with the increasing light intensity from 0.04 to 0.19 mW∙cm−2, at the fixed VG of 50 V (Fig. 2e). In the erasing operation, the transfer curve shifted in the opposite direction from the P-state, and this shift also occurred gradually depending on the magnitude of the applied negative VG (Supplementary Fig. 4). Additionally, we analyzed the retention characteristics of the device (Fig. 2f). The measured ID values at the VG of 0 V and drain voltage (VD) of −10 V in the P- and I-states were preserved for 10,000 s. Specifically, the ID in the P-state changed from 63.9 to 48.5 nA after 5000 s and was ultimately maintained at 41.5 nA after 10,000 s, demonstrating robust charge storage capability through the interface between the polymeric layers.
To provide deeper understanding for the memory operation in the proposed dual-mode device, we investigated charge injection, transport and trapping in the energy band structure (Fig. 2g and Supplementary Fig. 5). In this configuration, the two dielectric layers play distinct roles in facilitating interfacial charge trapping. The Parylene TDL allows photogenerated electrons in the DNTT channel to tunnel through, under the combined influence of optical and electrical input. Meanwhile, the pBDDA BDL effectively suppresses gate leakage and preserves the stored charges by preventing carrier transport toward the gate electrode. This interfacial trapping mechanism enables a stable charge storage without the need for a floating gate, thereby realizing both memory and synaptic functionalities in the dual-mode device. Hole carriers are predominantly present in p-type DNTT semiconductor, whereas high energy barrier between Au source/drain (S/D) electrodes and DNTT is present for electron carriers. Thus, with the absence of the injected electrons, electron trapping at the interface between pBDDA and Parylene hardly occurs even when a sufficiently high positive VG (50 V) is applied (Fig. 2g (left)). Accordingly, bias-induced programming is significantly restricted, which is consistent with the negligible shift in transfer curves in voltage-induced programming operation (Supplementary Fig. 3a). On the other hand, light irradiation with a wavelength of 455 nm can effectively generate electron-hole pairs in DNTT. Nevertheless, with the absence of the applied bias, energy band bending is insufficient to induce charge trapping at the pBDDA/Parylene interface (Fig. 2g (right)), leading to the subtle shift in transfer curve (Supplementary Fig. 3b). When the light and positive VG were applied, which induced electron carrier generation in DNTT and appropriate band bending, respectively, trapping of the photogenerated electrons is enabled (Fig. 2h). In other words, based on trap sites at the pBDDA/Parylene interface and photoresponse of DNTT, memory programming operation in the dual-mode device can be implemented by utilizing both light irradiation and voltage application. Thus, the memory window could be systematically tuned depending on the applied voltage and light intensity, while maintaining robust retention characteristics.
Synaptic operation of a dual-mode device triggered by optical stimulation
In addition to the memory behaviors, synaptic characteristics were also implemented in the proposed dual-mode device, by using the photoinduced charge trapping effect in the bilayer dielectric structure. To activate the synaptic behavior for emulating biological synapses, both optical and electrical stimulation were applied as presynaptic inputs, and the postsynaptic output was extracted based on the ID value (Fig. 3a). In particular, consecutively applied optical pulses gradually amplify electron trapping at the pBDDA/Parylene interface, which can be regarded as synaptic potentiation. In this process, the photogenerated electrons tunnel through the Parylene layer, while the holes migrate to the drain electrode of the device. As a result, excitatory postsynaptic current (EPSC) increases due to the enhanced photogating effect as optical stimulation continues. Conversely, synaptic depression occurs as electrons are progressively detrapped from the pBDDA/Parylene interface into the DNTT channel through VG pulses.
a Schematic representation of the synaptic operation of the dual-mode device including potentiation and depression via optical and VG pulses, respectively, based on charge trapping effect at the pBDDA/Parylene interface. b Potentiation–depression curve obtained by using optical (left) and electrical stimulation (right). c The change in EPSC according to the number of pulses and quantitative assessment of synaptic weight change. Synaptic weight modulation as a function of d light intensity, e pulse number, and f on-time through optical stimulation.
In the memory operation, both optical and electrical inputs were required to facilitate substantial charge trapping (Fig. 2g). In contrast, data transmission and processing are promoted by the gradual modulation of neurotransmitter movement in response to external stimuli in the synaptic behavior in nervous system. Consequently, light-generated synaptic weight by activating the device, while voltage weakened the synaptic connection, successfully emulating this behavior.
Figure 3b shows the potentiation–depression curve obtained in the synaptic operation of the dual-mode device, describing synaptic plasticity. Synaptic potentiation, represented by an increase in EPSC was achieved by using a total of 100 optical pulses with on-time for 1 s, off-time for 0.5 s, and an intensity of 0.18 mW∙cm−2, whereas VG pulses alternating between −10 V and −11 V every 0.5 s induced a decrease in EPSC, corresponding to synaptic depression. To qauntitatively evaluate the synaptic connection in terms of the potentiation–depression characteristics, synaptic weight changes were evaluated by extracting EPSC for each presynaptic input pulse and by using the following equation:
where Wn denotes the EPSC value at the nth pulse. Using the equation, synaptic weight changes were found to be 1.37 A ∙ A−1 and 1.22 A ∙ A−1 for potentiation and depression, respectively (Fig. 3c). These comparable values suggested that strengthening EPSC through optical stimulation can be counteracted by electrical stimulation, nearly restoring the synaptic weight to its initial state.
Two different mechanisms contribute to data processing in the nervous system, serving different functions. Short-term memory (STM) enables rapid responses to new stimuli and facilitates information filtering, whereas long-term memory (LTM), established via sustained and repetitive stimuli, enables long-term data storage and influences future behaviors and decision-making through learning. The proposed dual-mode device successfully mimicked these synaptic operations by modulating charge trapping in response to varying optical stimulation conditions. As shown in Fig. 3d–f, the transition from STM to LTM was achieved by adjusting optical stimulation parameters, including light intensity, number of pulses, and duration for light irradiation. Stronger light intensity induced a greater increase in EPSC compared to weaker one, and this trend persisted even after the optical stimulation was removed. Similarly, EPSC values increased proportionally with respect to the increasing number of pulses and on-time. Consequently, synaptic connection was enhanced or weakened depending on the conditions of the optical stimulation and our proposed device demonstrates the ability to mimic both transient and persistent synaptic behavior by light stimulation, which verifies its versatile potential for neuromorphic hardware applications49.
Fingerprint recognition-based identification classification and evaluation for flexible optoelectronic application
We applied our device to fingerprint recognition for identification (ID) classification, utilizing its ability to emulate synaptic characteristics and process data patterns. Fingerprint recognition is a widely used biometric modality for human identification, owing to its unique and consistent pattern. Based on these advantages, it is extensively applied in fields such as financial payment systems, secure authentication of electronic devices, and access control, among others. In recent years, artificial neural network (ANN)-based fingerprint recognition system has garnered significant research interest because of its robustness against noise and deformation, high accuracy, and system adaptability50,51. Conventional fingerprint recognition methods depend on explicitly defined feature point extraction and matching algorithms, which are susceptible to environmental variations such as changes in orientation, incomplete ridge impressions, and low-quality images52,53,54. In contrast, our ANN based on the dual-mode device enables adaptive learning and robust fingerprint recognition under challenging conditions such as rotation, partial fingerprints, and degraded image quality. To conduct the fingerprint recognition simulation, we used the long-term potentiation/depression (LTP/D) characteristics of the dual-mode device and designed the ANN consisting of an input layer with 4096 neurons, a hidden layer with 128 neurons, and an output layer with 10 neurons (Fig. 4a). For ID classification, fingerprint data from 10 individuals were used, with individuals representing distinct classes (i.e. 10 classes), and labels ranging from 0 to 9 were assigned to each class (Supplementary Fig. 6a). The ANN was then examined using the fingerprint dataset for 10 classes consisting of 50,000 training and 10,000 testing images. Figure 4b shows the simulation result over 30 training epochs. The average accuracy exceeded 90% and the maximum accuracy was 96% for 30 epochs. In the confusion matrix, the true ID (i.e. label) closely matched the predicted ID, which was obtained through the synaptic operation-based ANN training (Supplementary Fig. 6b). These results demonstrate the strong potential of the proposed dual-mode device to develop an authentication and security platform for matching a personal fingerprint with stored data. Moreover, such fingerprint recognition can further enhance the functionality of business cards, and the strong compatibility with paper substrates highlights the broad applicability of the proposed device across various fields.
a Schematic representation of fingerprint recognition-based ID classification using the proposed device. b Accuracy according to epoch for fingerprint recognition simulation. c Schematic representation of the comprehensive bending test for 500 cycles. d The change in memory window and e memory ratio over bending cycle. f The change in ID according to time after applying 100, 300, and 500 bending cycles. g The change in potentiation–depression curves as a function of bending cycle.
To further evaluate the performance of the dual-mode device, we conducted a comparative analysis of recently reported organic synaptic transistors, including the proposed device55,56,57,58,59. Supplementary Table 1 summarizes key comparison metrics such as device structure, weight-update signals, dynamic range, number of conductance states, recognition accuracy, and the ANN model. In particular, synaptic weight changes are represented by the dynamic range in Supplementary Table 1. While most previous studies report the dynamic range as a combined value across the full potentiation–depression curve, in this study, we separately extracted and reported the values for potentiation and depression. As a result, the dynamic range of the dual-mode device was lower than those reported in previous studies. However, the fingerprint recognition simulation still achieved a high accuracy of 90%, demonstrating competitive performance relative to prior reports (approximately 75%–93%). Furthermore, the dual-mode device successfully performed image recognition on a business card, highlighting its potential for applications in flexible optoelectronics.
Organic materials, known for their high suitability for flexibility and stretchability, offer a wide range of potential applications, including skin electronics and wearable devices60. The dual-mode device was fabricated using organic components (DNTT, Parylene, and pBDDA) to ensure stable operation when integrated onto a business card. Thus, we investigated its performance under the applied mechanical strain to evaluate the viability for flexible optoelectronics (Supplementary Fig. 7). Figure 4c outlines the comprehensive process of the bending test, which evaluates both the mechanical durability and ambient stability of the device. Initially, the memory and synaptic characteristics of the dual-mode device were examined in the pre-bending state, 133 days after device fabrication. The device was then subjected to 500 bending cycles using a cylindrical bar with a bending radius of 12.5 mm. We measured the memory and synaptic characteristics after 10, 50, 100, 300, and 500 cycles to assess the consistency of the device performance throughout the bending experiment. The memory operation showed stable behavior, and memory windows and memory ratios measured at VG of 0 V remained reliable after 500 bending cycles (Fig. 4d, e). Memory ratio was calculated by the following equation:
where \({I}_{p}\) and \({I}_{i}\) refer to the ID values corresponding to the pre-defined VG value of 0 V in the P-state and I-state, respectively. In the retention characteristics, the clearly distinguishable P- and I-states were preserved even after 500 bending cycles over 600 s, indicating that the device composed of the organic materials (pBDDA, Parylene, and DNTT) are well-suited for flexible optoelectronics (Fig. 4f). Additionally, the synaptic characteristics under cyclic mechanical deformation were analyzed, where reliable potentiation–depression curves were obtained, as shown in Fig. 4g. To further support the mechanical deformability of our device, fingerprint recognition simulation was performed in the same manner. Supplementary Fig. 8 shows that similar accuracies were maintained under the bending cycles with reliable recognition of fingerprint images where the average accuracies in pre-bending state and after 500 cycles were 89% and 85%, respectively. This slight degradation in accuracy can be attributed to variations in the potentiation–depression curves under identical stimulation, resulting from changes in charge trapping and detrapping dynamics induced by repeated mechanical strain. The confusion matrices also exhibited reliable potential for ID recognition on a business card, confirming consistent ability of the device to classify fingerprint images under mechanical stress (Supplementary Fig. 9).
Discussion
In summary, we demonstrated both memory and synaptic operations within the proposed dual-mode device fabricated on the business card, by utilizing the interfacial charge trapping effect between pBDDA and Parylene dielectric layers. The DNTT channel plays a crucial role in generating charge carriers under light illumination, enabling photoresponsive properties. Notably, without introducing additional layers or changing the device structure, distinct memory and synaptic characteristics were successfully implemented within a single device through the modulation of optical and electrical inputs. The device exhibited stable memory operation, maintaining each P- and E-state for 10,000 s, while biological synaptic plasticity was concurrently mimicked where synaptic weights were effectively modulated. By using the synaptic characteristics of the device, the potential for security applications was verified through fingerprint recognition-based identification. Moreover, the memory and synaptic characteristics remained stable even after 500 cycles of repeated mechanical deformation during the bending test. Therefore, the photoresponsive dual-mode memory transistor validated the capability to store charge and process synaptic signals with robust flexibility.
Methods
Material preparation
Dinaphtho[2,3-b:2′,3′-f]thieno[3,2-b]thiophene (DNTT), 1,4-butanediol diacrylate (BDDA), and tert-butyl peroxide (TBPO) were from Sigma-Aldrich. Parylene was supplied by Obang Technology (Gimpo, Korea). Au was purchased from iTASCO.
Fabrication of dual-mode device
As shown in Supplementary Fig. 10, the dual-mode device was fabricated on a business card. Al (thickness of 50 nm) was deposited on a business card substrate using a thermal evaporation method as a gate electrode (deposition rate of 1-3 Å∙s−1). Next, an initiated chemical vapor deposition (iCVD) process was conducted to form poly(1,4-butanediol diacrylate) (pBDDA) (thickness of 300 nm) and Parylene (thickness of 50 nm) was deposited atop the pBDDA blocking dielectric layer (BDL) as a tunneling dielectric layer (TDL) via a Parylene coater. In the iCVD process, the vaporized monomer (BDDA) and initiator (TBPO) were introduced into an iCVD reactor. The filament was heated to 200 °C to decompose initiators into radicals, and BDDA was heated to 75 °C to facilitate vaporization. The flow rates of the BDDA and TBPO were set to 0.23 and 0.24 standard cubic centimeters per minute (sccm), respectively. The chamber pressure and substrate temperature were kept at 150 mTorr and 35 °C. The synthesis of pBDDA via iCVD was optimized following the protocol established in the previous reports42,61,62,63. Following these processes, DNTT channel (thickness of 100 nm) was deposited using the thermal evaporation method, with channel length and width of 100 and 1000 μm, respectively (deposition rate of 0.2–0.3 Å∙s−1) (Supplementary Fig. 10). Finally, Au source and drain electrodes (thickness of 50 nm) were deposited via thermal evaporation (deposition rate of 0.9-1 Å∙s−1).
Analysis and Measurement
The electrical characteristics of the dual-mode device were measured by a probe station and a Keithley 4200A-SCS analyzer under an ambient environment. The LED light source with a wavelength of 455 nm (Mounted LEDs, Thorlabs, Inc., New Jersey, U.S.A.) was utilized for light illumination and a dark box was utilized to block external light in addition to the LED light source. In the case of the bending test, a cylindrical bar with a bending radius of 12.5 mm was used and the test was performed at room temperature and relative humidity of approximately 40%. The chemical composition of pBDDA was investigated through Fourier transform infrared spectrometer (FT-IR, Bruker Optics, USA) in an absorbance mode. Cross-sectional image of the device was obtained from Scanning Electron Microscope (SEM, Hitachi S4700, Hitachi Ltd, Tokyo, Japan). Ultraviolet Photoelectron Spectroscopy (UPS, AXIS SUPRA, Kratos. Inc., California, USA) and UV-vis spectroscopy (UV-vis, Lambda 750, PerkinElmer, The Commonwealth of Massachusetts, USA) were used to understand the optical properties and energy band structures of each material.
Fingerprint Recognition Simulation
For successful fingerprint recognition, we conducted hardware neural network simulations using 96 × 103 pixel 8-bit grayscale fingerprint images. These images were resized to 64 × 64 pixels and normalized to a range between 0 and 1 prior to training. The neural network was structured as a multilayer perceptron (MLP) consisting of an input layer (4096 neurons), a hidden layer (128 neurons), and an output layer (10 neurons). The training process involved forward propagation and backpropagation, reflecting long-term potentiation (LTP)/long-term depression (LTD) characteristics of the dual-mode device (Supplementary Fig. 11).
During forward propagation, the input image is converted into a 1-dimensional vector X (1 × 4096) and passed to the input layer. The input vector X is transformed into Z1 (1 × 128) by vector matrix multiplication (Z1 = X × W1) with the weight matrix W1 (4096 × 128) which has values ranging from –1 to 1. To enable non-linearity required for complex pattern recognition, Z1 is subsequently processed through the leaky rectified linear unit (Leaky ReLU) activation function. If the processed value is positive, the value remains unchanged. In contrast, when the processed value is negative, it is scaled by 0.01, which results in a non-linear value range between −0.01 and 1.0. The output vector Y1 (1 × 128) is then defined as Y1 = f(Z1) and fed into the hidden layer. The hidden layer output is then transformed into Z2 (1 × 10) by vector matrix multiplication (Z2 = Y1 × W2) with the weight matrix W2 (128 × 10) connected to the output layer. Z2 is processed through the Softmax activation function in the output layer, which converts it into a probability distribution over the 10 classes and results in the output vector Y2 = f(Z2) (1 × 10). The class with the highest probability in Y2 is selected as the final prediction.
During backpropagation, the error is defined as the difference between the predicted value and the actual label, and the gradient is computed based on this error. The sign of the gradient determines the adjustment direction of the weight. When the sign is positive, the weight is increased, whereas a negative sign leads to a decrease. This process is repeated iteratively to optimize the weights.
Our hardware neural network simulation is conducted using LTP/LTD characteristic data extracted from a single dual-mode memory transistor. Within the neural network, each synaptic weight (W) is defined by the conductance difference (GP − GD) extracted from two identical dual-mode memory transistors, reflecting LTP/LTD behavior of the device. When an input voltage (V) is applied to the synaptic device, the current difference flowing through the transistor is calculated by a subtractor as IP − ID = (GP − GD) × V = W × V. Accordingly, the synaptic weight is determined by the conductance difference formed through the potentiation and depression processes of the device, enabling neural network operations based on this mechanism.
Data availability
All the data generated and/or analyzed during the current study is available from the corresponding author on reasonable requests.
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Acknowledgements
This research was supported by the National Research Foundation of Korea (NRF) grant funded by the Korean Government (MSIT) (RS-2023-00210194, RS-2024-00438999, RS-2024-00442020, RS-2024-00454508). This work was also supported by Institute of Information & communications Technology Planning & Evaluation (IITP) under the artificial intelligence semiconductor support program to nurture the best talents (IITP-(2025)-RS-2023-00253914) grant funded by the Korea government(MSIT) and the research fund of Hanyang University (HY-2024-2696).
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S. Oh, J. Choi, and H. Yoo initiated and supervised all the research. G. Lee and H. Kim conducted and designed the experimental work and data analysis. S. Jeong synthesized the materials. G. Lee, S. Jeong, and H. Kim contributed equally to this work. All authors discussed the results and commented on the manuscript. The manuscript was written through contributions of all authors. All authors have given approval to the final version of the manuscript.
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Lee, G., Jeong, S., Kim, H. et al. Photoresponsive dual-mode memory transistor for optoelectronic computing: charge storage and synaptic signal processing. npj Flex Electron 9, 65 (2025). https://doi.org/10.1038/s41528-025-00444-1
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DOI: https://doi.org/10.1038/s41528-025-00444-1