Fig. 4: In vitro and in vivo characterization of silicon-based neural microelectrode arrays.
From: A local de-insulation method and its application in neural microneedle array
a EIS of the Au interface and the platinum black modified interface. b CV of the Au interface and the platinum black modified interface. c The left image shows a 16-channel silicon neural microelectrode array with a single Omnetics connector, manufactured using a local de-insulation method and implanted in a rat. The right image shows a 96-channel silicon neural microelectrode array with three Omnetics connectors, designed for use in large animals. d Schematic of electrode recording point locations, and the spike signals recorded from each channel. e Filtered signal of Ch.14 after 300 Hz to 3000 Hz bandpass filtering. f Autocorrelation of Ch.14, bin=5 ms
