Fig. 4: Principle of width measurement. | Microsystems & Nanoengineering

Fig. 4: Principle of width measurement.

From: Fast and accurate measurement of high aspect ratio MEMS trench array with optical lattice illumination

Fig. 4

a Tested trench array sample 2# (SEM-measured width: 5.08 μm) with focal plane selection schematic for width measurement (upper right inset). b High-contrast trench edge region (yellow dashed box) selected for width calculation; c Threshold-based binarization of (b) with edge feature extraction. d 3D top-view intensity map of b (color scale: normalized intensity); e 3D front-view intensity profile showing edge peaks. f Transverse intensity curve at Y = 8(ΔX = 36 pixels \(=\) trench width). g Intensity curves at multiple Y positions from (b)

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