Table 2 Characteristics of AlScN films depending on deposition methods

DC reactive magnetron sputtering

27

8.91 pm/V

<2°

500 nm

AlN/Pt/Ti

¹³⁶

DC reactive magnetron sputtering

6

-

0.31°

758 nm

Si

¹³⁷

AC-powered dual- cathode S-gun magnetron sputtering

30

-

1.58°

1000 nm

Mo/Si

⁸¹

Pulse DC reactive magnetron sputtering

13

−12.3 pC/N

<2°

900–1200 nm

Si

⁸³

Pulse DC reactive magnetron sputtering

22

−12.8 pC/N

1.95°

500 nm

Si

⁷⁵

Unipolar-bipolar hybrid pulse mode reactive magnetron sputtering

29.5

11–12 pm/V

2.2°

2500 nm

Pt/Ti/Si

⁷⁴