Fig. 15: Performances of metalens-based lithography systems.

a Schematics of the superlens sample structure. b Superlensing image, scale bar: 2 μm. c Schematic of the ZPAL system. d Schematic of the TPP system based on the proposed metafiber, M mirror, L lens, OL objective lens, C camera. e SEM image of sample pattern “NU” fabricated by the TPP system. f SEM image of different lines fabricated by the TPP system under laser powers of 6, 7, 8, and 9 mW from the top to the bottom. g Schematic of multi-focus TPP system using a traditional DOE (left) and the MFM (right), OBJ objective lens, TL tube lens, L lens, DCT dispersion compensating telescope, DOE diffractive optical element. h SEM image of the printed flower array, scale bar: 100 μm. With a magnified view of one flower, scale bar: 20 μm. i Schematic diagrams of the DLW lithography system based on a supercritical metalens, PH pinhole, AT attenuator, M mirror, LP linear polarizer, CL conventional lens. j–l SEM images of the grating patterns are presented in sequence from left to right, featuring pitches of 680, 650, 620, 590 and 560 nm, respectively. These patterns, each with a length of 4 μm, are patterned using the FZL- (j), SCL05- (k), and SCL10- (l) based DLW system. a, b Reprinted with permission from ref. ²³⁶. Copyright 2005 Institute of Physics Publishing. c Reprinted with permission from ref. ²³⁸. Copyright 2023 De Gruyter. d–f Reprinted with permission from ref. ¹⁹⁹. Copyright 2021 American Chemical Society. g, h Reprinted with permission from ref. ²⁴¹. Copyright 2024 John Wiley and Sons. i–l Reprinted with permission from ref. ²⁴². Copyright 2024 Institute of Optics and Electronics, Chinese Academy of Sciences