Table 2 Comparison of SiO2 deposited by PVD and PECVD

From: A surface acoustic wave tag utilizing a multilayer structure of SiO2/Pt/128°YX-LiNbO3 for operation at 600 °C

Deposition process

Surface roughness

Refractive index

PVD

1.5 nm

1.46

PECVD

3.5 nm

1.45

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