Table 1 Identification of typical deep levels in 4H-SiC in equilibrium and nonequilibrium with different dimensional parameters

From: Multidimensional defect identification of semiconductors in nonequilibrium

 

EH1/S1

 

VCVC( = / − )/CAV(=/−)/

SiCVSi(=/−)/SiCVSi(−/0)

VCVC(=/−)

VCVC( = / − )/CAV(=/−)

Z1/2

VC( = /0)

VC( = /0)

VC( = /0)

VC( = /0)

EH3/S2

 

VCVC( − /0)/VSi(=/−)/CAV(−/0)

VCVC( − /0)

VCVC( − /0)/CAV(−/0)

EH4

 

VCVC( − /0)/VSi(=/−)/

CAV(−/0)/CAV(0/+)

VSi(=/−)

 

EH5

 

VSi(=/−)/CAV(−/0)/CAV(0/+)

 

CAV(0/+)

EH6/7

 

VSiVC(=/0)

VSiVC(=/0)

VSiVC(=/0)

  1. (I) corresponds to 4H-SiC in equilibrium with \((\Delta E,\sigma )\). (Ⅱ) corresponds to 4H-SiC in nonequilibrium with \((\Delta E,\sigma )\). (Ⅲ) corresponds to irradiated 4H-SiC with \((\Delta E,\sigma,C)\) at the room temperature. (Ⅳ) corresponds to irradiated 4H-SiC with \((\Delta E,\sigma,C)\) at the high temperature. The explanations of all defect notations can be found in Irradiation and annealing simulations in “Methods” section.