Table 1 Deposition conditions for the transparent TFB layers

From: Operando microimaging of crystal structure and orientation in all components of all-solid-state-batteries

film

target

Power

pressure

gas flow rate

deposition rate

  

(W.cm-2)(*)

(Pa)

(sccm)

(nm.min-1)

    

Ar

O2

N2

 

Ti

Ti

2.7, DC

1

45

-

-

33

LiCoO2

LiCoO2

2.3, DC

2

130

-

-

70

LiPON

Li3PO4

1.8, RF

0.6

-

-

100

11

  1. (*) RF and DC power sources are respectively for radio-frequency and direct current.
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