Abstract
Colloidal quantum dots (QDs) are leading candidates for next-generation optoelectronics owing to their tuneable bandgaps, narrow emission linewidths, and high luminescence quantum yields. For virtual-, augmented-, and mixed-reality display applications of these materials, patterning full-color QDs at μm-length scales is essential. However, existing photolithographic approaches often degrade QD luminance characteristics by exposing them to harsh processing conditions, or they compromise the structural fidelity of the resulting patterns. Here we report a photoresist-guided indirect (PIN) photopatterning strategy that includes (i) lithographic formation of sacrificial PR patterns, (ii) deposition of a crosslinked QD film on top, and (iii) PR stripping that removes the sacrificial PR, leaving behind crosslinked QD patterns on the substrate. QD crosslinking is mediated by a diazo-based ligand thermocrosslinker, Diazo-4-LiXer. Leveraging low-temperature (110–120 °C)-activated carbene chemistry, Diazo-4-LiXer bridges neighbouring QDs while maintaining their intrinsic photoluminescence and electroluminescence through repeated processing. Moreover, Diazo-4-LiXer enables thermocrosslinking without affecting the underlying photoresist pre-patterns, which serve as structural templates determining the thickness and fidelity of the QD patterns. Using PIN photopatterning, we realize high-fidelity RGB patterns exceeding 4,000 pixels per inch resolution and demonstrate integration-level scalability by fabricating a 10 × 10 passive-matrix full-colour RGB QD–LED array.
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The data that support the findings of this study are available from the corresponding authors upon request. Source data are provided with this paper.
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Acknowledgements
This work was supported by the Samsung Research Funding & Incubation Center of Samsung Electronics under project number SRFC-MA1901-51. This work was also supported by the National Research Foundation of Korea (NRF) grants funded by the Ministry of Science, ICT, and Future Planning (2021R1A2C2008332 and RS-2024-00445116).
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B.K., M.S.K., and C.K. conceptualized and supervised the project. H.H. and M.L. synthesized and characterized the crosslinker and organic molecules. H.K., C.H.L., S.R., J.K., S.Y.P., S.J.L., H.B., S.L., H.J., and Y.H.J. characterized crosslinked QD films and conducted the PIN photopatterning. J.S.P., H.J.L., J.W.P., J.S., W.K.B., and C.K. fabricated the electrical devices. H.K., H.H., and C.H.L. wrote the manuscript, and all authors reviewed the manuscript.
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Kim, H., Ham, H., Lim, C.H. et al. Photoresist-guided indirect photopatterning of quantum dots via carbene-mediated ligand thermocrosslinking. Nat Commun (2026). https://doi.org/10.1038/s41467-026-70770-z
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DOI: https://doi.org/10.1038/s41467-026-70770-z
