Fig. 5: Developmental phenotypes in tsk-4 plants are a consequence of the DDR. | Nature Communications

Fig. 5: Developmental phenotypes in tsk-4 plants are a consequence of the DDR.

From: TONSOKU prevents the formation of large tandem duplications and restrains ATR–WEE1 checkpoint activation

Fig. 5: Developmental phenotypes in tsk-4 plants are a consequence of the DDR.

A Variable phenotypes in tsk-4 plants: (i) representative images of tsk-4 sibling plants. Spiral phyllotaxis in (ii) Col-0 is disrupted in tsk-4 plants resulting in stochastic (iii) double silique nodes, (iv) fused stems and (v) fasciation. Scale bars are 5 cm. B Percentage of double silique nodes in F2 populations of Col-0 x tsk-4 crosses. Sample sizes are indicated below. Bars represent means with 95% confidence intervals. Lower case letters represent pairwise comparisons of a one-way ANOVA (F(6, 217) = 32.87, p = 4.83 × 10−28, ω² = 0.460) with Tukey’s Honestly Significant Difference post hoc testing. C Mean percentage of co-expressed SOG1-regulated gene groups (as defined by Bourbousse et al.71) that are either up- or down-regulated in tsk-4 plants relative to Col-0. Error bars represent standard errors from three independent plants. D Size of individual duplications in tsk-4 sog1-1 and tsk-4 wee1-2 (second-generation plants), and the single mutants grown alongside. Each point is an individual duplication. Region ≤100 kb shaded in dark gray, region ≤400 kb in light gray. PERMANOVA on pairwise 1-Wasserstein distances between plant-level log2 tandem duplication size distributions were performed for tsk-4 and tsk-4 sog1-1 (pseudo-F = 1.28, R2 = 0.176, adj. p = 0.607), and tsk-4 and tsk-4 wee1-2 (pseudo-F = 0.196, R2 = 0.047, adj. p = 0.667). E Percentage of double silique nodes in second-generation tsk-4 sog1-1 mutants. Sample sizes, bars and letters (F(13, 146) = 30.94, p = 1.65 × 10−35, ω²=0.71) as in (B). F Percentage of double silique nodes in second-generation tsk-4 atr-2 mutants. Sample sizes, bars and letters (F(9, 187) = 75.7, p = 1.43 × 10−57, ω²=0.77) as in (B). G Percentage of double silique nodes in second-generation tsk-4 wee1-2 mutants. Sample sizes, bars and letters (F(11, 204) = 71.94, p = 1.54 × 10−69, ω² = 0.76) as in (B). Source data are provided as a Source Data file.

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