Fig. 1: High-throughput materials exploration system for the anomalous Hall effect (AHE). | npj Computational Materials

Fig. 1: High-throughput materials exploration system for the anomalous Hall effect (AHE).

From: High-throughput materials exploration system for the anomalous Hall effect using combinatorial experiments and machine learning

Fig. 1

a Conventional trial-and-error-type one-by-one manual approach consisting of (i) individual deposition of a uniform thin film with a single composition, (ii) device fabrication using multi-step lithography processes with photoresists, and (iii) AHE measurement using a wire-bonding method. b High-throughput materials exploration system consisting of (i’) deposition of composition-spread films using a combinatorial sputtering system, (ii’) photoresist-free facile multiple-device fabrication using a laser patterning system, and (iii’) simultaneous AHE measurement of multiple devices using a customized multichannel probe developed in this study.

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