we present a novel paradigm that suppresses the reflection of light from a metallic surface by using an ultrathin CuO coating. This antireflection concept relies on the strong inference inside the ultrathin absorptive CuO coating. We derive the optimal conditions for minimum reflectance and expound how the film thickness impacts the reflectance. Almost zero reflectance can be obtained at wavelength of ca. 550 nm over a wide range of incident angles. This technology has the potential for many applications, especially viable for photoelctrochemical cells, which requires strong absorption and short carrier collection length.
- Hongyan Liu
- Jingjing Peng
- Yue Yan
