A One‐Transistor Logic Gate with 50% Smaller Footprint by Foundry Process and Beyond

Journal:

Advanced Functional Materials

Published:

2025-07-17

DOI:

10.1002/adfm.202421204

Affiliations:

3

Authors:

9

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Institutions	Authors	Share
Ningbo Institute of Industrial Technology (CNITECH), CAS, China	5.000000	0.56
Harbin Institute of Technology (HIT), China	3.000000	0.33
Shanghai Institute of Microsystem and Information Technology (SIMIT), CAS, China	1.000000	0.11

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