Tin‐Oxo Nanocluster Composite Films as Positive‐Tone Photoresist for Extreme UV Lithography

Journal:
Advanced Functional Materials
Published:
DOI:
10.1002/adfm.202503002
Affiliations:
5
Authors:
12
Go to article
Institutions Authors Share
Samsung Electronics Co., Ltd., South Korea
6.000000
 0.50
Inha University, South Korea
4.000000
 0.33
University of Seoul (UOS), South Korea
2.000000
 0.17
Interested in Nanotechnology?