Focused Helium Ion Beam for Direct Patterning of Monolayer MoSsub2/sub Nanoribbon Field Effect Devices

Journal:: Advanced Functional Materials
Published:: 2025-08-07
DOI:: 10.1002/adfm.202514880
Affiliations:: 4
Authors:: 9

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Institutions	Authors	Share
Purdue University, United States of America (USA)	6.000000	0.67
Oak Ridge National Laboratory (ORNL), United States of America (USA)	3.000000	0.33

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