Alkali Ion-Incorporated HfO2 Dielectrics for Reconfigurable Neuromorphic Computing

Journal:

Advanced Functional Materials

Published:

2025-11-13

DOI:

10.1002/adfm.202521002

Affiliations:

2

Authors:

8

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Institutions	Authors	Share
Yonsei University, South Korea	7.000000	0.88
University of Pennsylvania (Penn), United States of America (USA)	1.000000	0.13

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