Understanding and Tuning Mobile Interfaces in Ferroelectric Hf0.5Zr0.5O2 Thin Films in Relation to Microstructure

Journal:

Advanced Functional Materials

Published:

2026-02-19

DOI:

10.1002/adfm.202521716

Affiliations:

6

Authors:

12

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Institutions	Authors	Share
University of Cambridge, United Kingdom (UK)	5.000000	0.42
Samsung Advanced Institute of Technology (SAIT), South Korea	3.000000	0.25
Purdue University, United States of America (USA)	2.000000	0.17
Sandia National Laboratories, United States of America (USA)	1.000000	0.08
Hahn-Schickard-Gesellschaft für angewandte Forschung e.V. (HSG), Germany	0.500000	0.04
Institute of Physics (IP), Croatia	0.500000	0.04

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