Dielectric Gene Tailoring and Interfacial Polarization Relaxation in Mo─Fe Bimetallic Carbide for Low-Frequency Electromagnetic Response

Journal:
Advanced Functional Materials
Published:
DOI:
10.1002/adfm.202524804
Affiliations:
5
Authors:
9
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Institutions Authors Share
Beijing Institute of Technology (BIT), China
4.000000
 0.44
Southeast University (SEU), China
3.000000
 0.33
State Key Laboratory of Coatings for Advanced Equipment, China
2.000000
 0.22
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