Tin-Oxo Nanocluster Extreme UV Photoresists Equipped with Chemical Features for Atmospheric Stability and High EUV Sensitivity

Journal:

Advanced Functional Materials

Published:

2025-11-26

DOI:

10.1002/adfm.202525300

Affiliations:

8

Authors:

19

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Institutions	Authors	Share
Inha University, South Korea	5.000000	0.26
Pohang University of Science and Technology (POSTECH), South Korea	4.000000	0.21
Samsung Electronics Co., Ltd., South Korea	3.500000	0.18
University of Seoul (UOS), South Korea	3.000000	0.16
Chonnam National University, South Korea	3.000000	0.16
Hanyang University (HYU), South Korea	0.500000	0.03

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