In‐Cycle Helium Plasma Integrated Atomic Layer Deposition Process for Screening Effect Alleviation and Performance Enhancement in a‐IGZO TFTs

Journal:

Advanced Functional Materials

Published:

2025-11-20

DOI:

10.1002/adfm.202527758

Affiliations:

4

Authors:

11

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Institutions	Authors	Share
Seoul National University (SNU), South Korea	8.500000	0.77
Samsung Advanced Institute of Technology (SAIT), South Korea	1.500000	0.14
Samsung Electronics Co., Ltd., South Korea	0.500000	0.05
Advanced Institutes of Convergence Technology (AICT), SNU, South Korea	0.500000	0.05

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