Adaptive Epitaxy of C‐Si‐Ge‐Sn: Customizable Bulk and Quantum Structures

Journal:
Advanced Materials
Published:
DOI:
10.1002/adma.202506919
Affiliations:
7
Authors:
16
Institutions Authors Share
JARA Fundamentals of Future Information Technology (JARA-FIT), Germany
7.000000
0.44
Innovations for High Performance Microelectronics (IHP), Germany
3.500000
0.22
CEA Laboratory of Electronics and Information Technology (LETI), France
3.000000
0.19
University of Stuttgart, Germany
1.000000
0.06
University College Cork (UCC), Ireland
0.500000
0.03
Tyndall National Institute (TNI), Ireland
0.500000
0.03
University of Roma Tre, Italy
0.500000
0.03