Field-Induced Structural Dynamics of Polarization Switching in HfxZr1-xO2 Thin Films
- Journal:
- Advanced Materials
- Published:
- DOI:
- 10.1002/adma.202510930
- Affiliations:
- 4
- Authors:
- 20
| Institutions | Authors | Share |
|---|---|---|
| Samsung Advanced Institute of Technology (SAIT), South Korea | 0.55 | |
| Samsung Electronics Co., Ltd., South Korea | 0.30 | |
| Pohang University of Science and Technology (POSTECH), South Korea | 0.15 |