Field-Induced Structural Dynamics of Polarization Switching in HfxZr1-xO2 Thin Films

Journal:
Advanced Materials
Published:
DOI:
10.1002/adma.202510930
Affiliations:
4
Authors:
20
Institutions Authors Share
Samsung Advanced Institute of Technology (SAIT), South Korea
11.000000
11.000000
0.55
Samsung Electronics Co., Ltd., South Korea
6.000000
0.30
Pohang University of Science and Technology (POSTECH), South Korea
3.000000
0.15