Heteroepitaxial Strain Engineering and Interfacial Energy Transfer Boosting Optoelectronic Properties in C60/WS2 van der Waals Heterostructures

Journal:

Advanced Materials

Published:

2025-10-28

DOI:

10.1002/adma.202516798

Affiliations:

8

Authors:

10

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Institutions	Authors	Share
Tsinghua-Berkeley Shenzhen Institute (TBSI), China	6.000000	0.60
Harbin Institute of Technology (HIT), China	1.000000	0.10
Korea Institute of Science and Technology (KIST), South Korea	0.500000	0.05
KIST School, UST, South Korea	0.500000	0.05
Shenzhen Institutes of Advanced Technology (SIAT), CAS, China	0.500000	0.05
Shenyang National Laboratory for Materials Science (SYNL), IMR CAS, China	0.500000	0.05
Humboldt University of Berlin (HU Berlin), Germany	0.500000	0.05
Helmholtz-Zentrum Berlin for Materials and Energy (HZB), Germany	0.500000	0.05

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