High Photostrictive Strain Rate in Ferroelectric AlScN Thin Films

Journal:
Advanced Materials
Published:
DOI:
10.1002/adma.202519418
Affiliations:
3
Authors:
9
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Institutions Authors Share
Institute of Materials Research and Engineering (IMRE), A*STAR, Singapore
7.000000
 0.78
Nanyang Technological University (NTU), Singapore
1.000000
 0.11
National University of Singapore (NUS), Singapore
1.000000
 0.11
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