A Critical Strain Window for Stabilizing Polar Orthorhombic Hf0.5Zr0.5O2 Epitaxial Thin Films with Scale-Free Domain Walls

Journal:
Advanced Materials
Published:
DOI:
10.1002/adma.202521362
Affiliations:
4
Authors:
11
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Institutions Authors Share
Southern University of Science and Technology (SUSTech), China
6.000000
 0.55
National Synchrotron Radiation Laboratory (NSRL), USTC, China
3.000000
 0.27
Xiangtan University (XTU), China
2.000000
 0.18
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